P

Inventor

KANEKO HIDEO

JP85 patents
⚠️ This page may combine multiple inventors who share the name “KANEKO HIDEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHINETSU CHEMICAL CO

29 patents
US7736824B2Jun 15, 2010

Photomask blank, photomask, and method of manufacture

SHINETSU CHEMICAL CO26 citations92
US9366951B2Jun 14, 2016

Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure method

SHINETSU CHEMICAL CO8 citations84
US7264908B2Sep 4, 2007

Photo mask blank and photo mask

SHINETSU CHEMICAL CO17 citations82
US7195846B2Mar 27, 2007

Methods of manufacturing photomask blank and photomask

SHINETSU CHEMICAL CO13 citations82
US6666957B2Dec 23, 2003

Magnetron sputtering system and photomask blank production method based on the same

SHINETSU CHEMICAL CO8 citations74
US6503669B2Jan 7, 2003

Photomask blank, photomask and method of manufacture

SHINETSU CHEMICAL CO8 citations74
US6451489B1Sep 17, 2002

Phase shift photomask

SHINETSU CHEMICAL CO10 citations74
US11624712B2Apr 11, 2023

Substrate defect inspection method and substrate defect inspection apparatus

SHINETSU CHEMICAL CO2 citations73
US10678125B2Jun 9, 2020

Photomask blank and method for preparing photomask

SHINETSU CHEMICAL CO5 citations73
US10466583B2Nov 5, 2019

Halftone phase shift mask blank and halftone phase shift mask

SHINETSU CHEMICAL CO2 citations73
US10146122B2Dec 4, 2018

Halftone phase shift photomask blank and making method

SHINETSU CHEMICAL CO2 citations73
US9645485B2May 9, 2017

Halftone phase shift photomask blank and making method

SHINETSU CHEMICAL CO4 citations73
US6641958B2Nov 4, 2003

Phase shift mask blank, phase shift mask, and methods of manufacture

SHINETSU CHEMICAL CO6 citations73
US5582897ADec 10, 1996

Magnetic recording medium

SHINETSU CHEMICAL CO12 citations73
US5554303ASep 10, 1996

Magnetic recording medium preparation

SHINETSU CHEMICAL CO8 citations72
US5521781AMay 28, 1996

Substrate for magnetic recording medium

SHINETSU CHEMICAL CO16 citations69
US6589699B2Jul 8, 2003

Photomask blank and photomask

SHINETSU CHEMICAL CO4 citations63
US6503668B2Jan 7, 2003

Phase shift mask blank, phase shift mask, and method of manufacture

SHINETSU CHEMICAL CO4 citations63
US5643650AJul 1, 1997

Magneto-optical recording medium

SHINETSU CHEMICAL CO5 citations63
US12181790B2Dec 31, 2024

Reflective mask blank and reflective mask

SHINETSU CHEMICAL CO0 citations62
US11327393B2May 10, 2022

Photomask blank and method for preparing photomask

SHINETSU CHEMICAL CO0 citations62
US10989999B2Apr 27, 2021

Halftone phase shift mask blank and halftone phase shift mask

SHINETSU CHEMICAL CO0 citations62
US10372030B2Aug 6, 2019

Halftone phase shift mask blank and halftone phase shift mask

SHINETSU CHEMICAL CO1 citations62
US7037625B2May 2, 2006

Phase shift mask blank and method of manufacture

SHINETSU CHEMICAL CO2 citations62
US6514642B2Feb 4, 2003

Phase shift mask and method of manufacture

SHINETSU CHEMICAL CO5 citations62
US5720861AFeb 24, 1998

Magnetic recording medium

SHINETSU CHEMICAL CO4 citations62
US5591502AJan 7, 1997

Magnetic recording medium

SHINETSU CHEMICAL CO5 citations62
US5514468AMay 7, 1996

Magneto-optical recording medium

SHINETSU CHEMICAL CO2 citations62
US6733930B2May 11, 2004

Photomask blank, photomask and method of manufacture

SHINETSU CHEMICAL CO2 citations61

KAWASAKI HEAVY IND LTD

6 patents

INOUE JAPAX RES

3 patents

SHIN ESTU CHEMICAL CO LTD

2 patents

TAMAGAWA MACHINERY CO LTD

2 patents

SUMITOMO CHEMICAL CO

2 patents

IGARASHI SHINICHI

2 patents

FUJI ELECTRIC CO LTD

1 patent

KANEKO HIDEO

1 patent

INAZUKI YUKIO

1 patent

YOSHIKAWA HIROKI

1 patent

Showing the top 50 of 85 patents by PatentIndex Score.