Inventor
NAGANO OSAMU
JP40 patents
⚠️ This page may combine multiple inventors who share the name “NAGANO OSAMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
12 patentsUS5726419AMar 10, 1998
Pulse welding apparatus
MITSUBISHI ELECTRIC CORP54 citations96
US5416299AMay 16, 1995
Pulse welding apparatus
MITSUBISHI ELECTRIC CORP54 citations96
US5317116AMay 31, 1994
Pulse welding apparatus
MITSUBISHI ELECTRIC CORP48 citations96
US5841096ANov 24, 1998
Laser machining apparatus and method of controlling same
MITSUBISHI ELECTRIC CORP22 citations92
US5638389AJun 10, 1997
Output control apparatus for laser oscillator
MITSUBISHI ELECTRIC CORP24 citations92
US5495091AFeb 27, 1996
Pulse welding apparatus
MITSUBISHI ELECTRIC CORP42 citations92
US5406052AApr 11, 1995
Pulsed arc welding equipment
MITSUBISHI ELECTRIC CORP26 citations92
US5281791AJan 25, 1994
Pulsed arc welding apparatus
MITSUBISHI ELECTRIC CORP41 citations92
US5961857AOct 5, 1999
Laser machining apparatus with feed forward and feedback control
MITSUBISHI ELECTRIC CORP16 citations81
US5499257AMar 12, 1996
Output control apparatus for laser oscillator
MITSUBISHI ELECTRIC CORP7 citations73
US5408482AApr 18, 1995
Apparatus for and method of controlling the output of a laser source
MITSUBISHI ELECTRIC CORP12 citations73
US6008469ADec 28, 1999
Laser beam branching apparatus
MITSUBISHI ELECTRIC CORP10 citations70
TOSHIBA KK
10 patentsUS6563308B2May 13, 2003
Eddy current loss measuring sensor, thickness measuring system, thickness measuring method, and recorded medium
TOSHIBA KK144 citations98
US7692163B2Apr 6, 2010
Charged particle beam apparatus, defect correcting method, etching method, deposition method, and charge preventing method
TOSHIBA KK8 citations84
US6940080B2Sep 6, 2005
Charged particle beam lithography system, lithography method using charged particle beam, method of controlling charged particle beam, and method of manufacturing semiconductor device
TOSHIBA KK12 citations84
US7095023B2Aug 22, 2006
Charged particle beam apparatus, charged particle detection method, and method of manufacturing semiconductor device
TOSHIBA KK8 citations74
US7491945B2Feb 17, 2009
Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device
TOSHIBA KK4 citations63
US7304320B2Dec 4, 2007
Charged beam exposure apparatus, charged beam control method and manufacturing method of semiconductor device
TOSHIBA KK6 citations63
US7109501B2Sep 19, 2006
Charged particle beam lithography system, pattern drawing method, and method of manufacturing semiconductor device
TOSHIBA KK6 citations63
US7047154B2May 16, 2006
Interconnection pattern inspection method, manufacturing method of semiconductor device and inspection apparatus
TOSHIBA KK4 citations63
US7640138B2Dec 29, 2009
Interconnection pattern inspection method, manufacturing method of semiconductor device and inspection apparatus
TOSHIBA KK0 citations52
US8357895B2Jan 22, 2013
Defect inspection apparatus, defect inspection method, and semiconductor device manufacturing method
TOSHIBA KK0 citations42
ASAHI CHEMICAL IND
3 patentsUS5658842AAug 19, 1997
Ammoxidation catalyst composition, and process for producing acrylonitrile or methacrylonitrile using the same
ASAHI CHEMICAL IND51 citations91
US5200331AApr 6, 1993
Method of producing an amide utilizing a microorganism
ASAHI CHEMICAL IND29 citations88
US7087551B2Aug 8, 2006
Catalyst for use in catalytic oxidation or ammoxidation of propane or isobutane in the gaseous phase
ASAHI CHEMICAL IND11 citations84
TOSHIBA MEMORY CORP
3 patentsUS10309913B2Jun 4, 2019
Pattern inspection method using charged particle beam
TOSHIBA MEMORY CORP0 citations42
US10803576B2Oct 13, 2020
Defect inspection apparatus and defect inspection method
TOSHIBA MEMORY CORP0 citations33
US10677743B1Jun 9, 2020
Inspection apparatus and inspection method
TOSHIBA MEMORY CORP0 citations33
NAGANO OSAMU
2 patentsUS8090186B2Jan 3, 2012
Pattern inspection apparatus, pattern inspection method, and manufacturing method of semiconductor device
NAGANO OSAMU12 citations82
US8121390B2Feb 21, 2012
Pattern inspection method, pattern inspection apparatus and semiconductor device manufacturing method
NAGANO OSAMU3 citations60