Inventor
OSAKI HARUYOSHI
JP20 patents
Patents
20 patentsUS4812551AMar 14, 1989
Novolak resin for positive photoresist
SUMITOMO CHEMICAL CO56 citations95
US5866724AFeb 2, 1999
Positive resist composition and photosensitizers
SUMITOMO CHEMICAL CO19 citations92
US5468590ANov 21, 1995
Positive resist composition
SUMITOMO CHEMICAL CO24 citations91
US5429904AJul 4, 1995
Positive resist composition
SUMITOMO CHEMICAL CO21 citations91
US5861229AJan 19, 1999
Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
SUMITOMO CHEMICAL CO7 citations73
US5792585AAug 11, 1998
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO7 citations73
US5736292AApr 7, 1998
Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups
SUMITOMO CHEMICAL CO9 citations73
US5726217AMar 10, 1998
Tetraphenol compounds and process for producing the same
SUMITOMO CHEMICAL CO10 citations73
US5188920AFeb 23, 1993
Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound
SUMITOMO CHEMICAL CO10 citations73
US5451484ASep 19, 1995
Positive resist composition
SUMITOMO CHEMICAL CO9 citations71
US5807656ASep 15, 1998
Polyhydroxy compound and a positive photoresist containing the same
SUMITOMO CHEMICAL CO2 citations63
US5288587AFeb 22, 1994
Radiation-sensitive positive resist composition comprising an o-quinone diazide, an alkali-soluble resin and a polyphenol compound
SUMITOMO CHEMICAL CO5 citations63
US5965748AOct 12, 1999
Succinimide derivative, process for production and use thereof
SUMITOMO CHEMICAL CO2 citations62
US5783355AJul 21, 1998
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO1 citations62
US5395727AMar 7, 1995
Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol
SUMITOMO CHEMICAL CO5 citations62
US5336583AAug 9, 1994
Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone
SUMITOMO CHEMICAL CO5 citations62
US5326665AJul 5, 1994
Positive type resist composition
SUMITOMO CHEMICAL CO6 citations62
US5843616ADec 1, 1998
Positive resist composition
SUMITOMO CHEMICAL CO2 citations60
US6383708B1May 7, 2002
Positive resist composition
SUMITOMO CHEMICAL CO1 citations52
US5792586AAug 11, 1998
Positive resist composition comprising a novolac resin made from a cycloalkyl substituted phenol
SUMITOMO CHEMICAL CO1 citations52