Inventor
CHA TAEHO
KR2 patents
Patents
2 patentsUS7939401B2May 10, 2011
Dual gate structure, fabrication method for the same, semiconductor device having the same, and semiconductor device fabrication method
SAMSUNG ELECTRONICS CO LTD0 citations45
US7635897B2Dec 22, 2009
Dual gate structure, fabrication method for the same, semiconductor device having the same
SAMSUNG ELECTRONICS CO LTD1 citations45