Inventor
KOSHIZAWA TAKEHITO
US26 patents
Patents
26 patentsUS9385028B2Jul 5, 2016
Air gap process
APPLIED MATERIALS INC146 citations97
US10998329B2May 4, 2021
Methods and apparatus for three dimensional NAND structure fabrication
APPLIED MATERIALS INC11 citations85
US11469097B2Oct 11, 2022
Carbon hard masks for patterning applications and methods related thereto
APPLIED MATERIALS INC2 citations73
US11043372B2Jun 22, 2021
High-density low temperature carbon films for hardmask and other patterning applications
APPLIED MATERIALS INC4 citations73
US10954129B2Mar 23, 2021
Diamond-like carbon as mandrel
APPLIED MATERIALS INC3 citations73
US10910381B2Feb 2, 2021
Multicolor approach to DRAM STI active cut patterning
APPLIED MATERIALS INC1 citations73
US9508561B2Nov 29, 2016
Methods for forming interconnection structures in an integrated cluster system for semicondcutor applications
APPLIED MATERIALS INC6 citations73
US12486577B2Dec 2, 2025
Pulsed plasma (DC/RF) deposition of high quality C films for patterning
APPLIED MATERIALS INC0 citations62
US12482646B2Nov 25, 2025
Processes for depositing SiB films
APPLIED MATERIALS INC0 citations62
US12198936B2Jan 14, 2025
Defect free germanium oxide gap fill
APPLIED MATERIALS INC0 citations62
US12183578B2Dec 31, 2024
Method for forming and patterning a layer and/or substrate
APPLIED MATERIALS INC0 citations62
US12148475B2Nov 19, 2024
Selection gate separation for 3D NAND
APPLIED MATERIALS INC0 citations62
US12018364B2Jun 25, 2024
Super-conformal germanium oxide films
APPLIED MATERIALS INC0 citations62
US11791155B2Oct 17, 2023
Diffusion barriers for germanium
APPLIED MATERIALS INC0 citations62
US11781218B2Oct 10, 2023
Defect free germanium oxide gap fill
APPLIED MATERIALS INC0 citations62
US11784042B2Oct 10, 2023
Carbon hard masks for patterning applications and methods related thereto
APPLIED MATERIALS INC0 citations62
US11638374B2Apr 25, 2023
Multicolor approach to DRAM STI active cut patterning
APPLIED MATERIALS INC0 citations62
US11603591B2Mar 14, 2023
Pulsed plasma (DC/RF) deposition of high quality C films for patterning
APPLIED MATERIALS INC0 citations62
US11545504B2Jan 3, 2023
Methods and apparatus for three dimensional NAND structure fabrication
APPLIED MATERIALS INC0 citations62
US11430801B2Aug 30, 2022
Methods and apparatus for three dimensional NAND structure fabrication
APPLIED MATERIALS INC0 citations62
US11335690B2May 17, 2022
Multicolor approach to DRAM STI active cut patterning
APPLIED MATERIALS INC0 citations62
US11145509B2Oct 12, 2021
Method for forming and patterning a layer and/or substrate
APPLIED MATERIALS INC1 citations62
US12033848B2Jul 9, 2024
Processes for depositing sib films
APPLIED MATERIALS INC0 citations61
US12334358B2Jun 17, 2025
Integration processes utilizing boron-doped silicon materials
APPLIED MATERIALS INC0 citations58
US10403502B2Sep 3, 2019
Boron doped tungsten carbide for hardmask applications
APPLIED MATERIALS INC0 citations52
US11638377B2Apr 25, 2023
Self-aligned select gate cut for 3D NAND
APPLIED MATERIALS INC0 citations51