Inventor
MALLICK ABHIJIT B
US15 patents
Patents
15 patentsUS11158507B2Oct 26, 2021
In-situ high power implant to relieve stress of a thin film
APPLIED MATERIALS INC2 citations72
US11557466B2Jan 17, 2023
Tuneable uniformity control utilizing rotational magnetic housing
APPLIED MATERIALS INC2 citations71
US11550222B2Jan 10, 2023
Dose reduction of patterned metal oxide photoresists
APPLIED MATERIALS INC3 citations70
US12486577B2Dec 2, 2025
Pulsed plasma (DC/RF) deposition of high quality C films for patterning
APPLIED MATERIALS INC0 citations62
US11603591B2Mar 14, 2023
Pulsed plasma (DC/RF) deposition of high quality C films for patterning
APPLIED MATERIALS INC0 citations62
US11557478B2Jan 17, 2023
In-situ high power implant to relieve stress of a thin film
APPLIED MATERIALS INC0 citations62
US12362181B2Jul 15, 2025
Methods of forming thermally stable carbon film
APPLIED MATERIALS INC0 citations61
US12033848B2Jul 9, 2024
Processes for depositing sib films
APPLIED MATERIALS INC0 citations61
US11270905B2Mar 8, 2022
Modulating film properties by optimizing plasma coupling materials
APPLIED MATERIALS INC0 citations61
US11011371B2May 18, 2021
SiBN film for conformal hermetic dielectric encapsulation without direct RF exposure to underlying structure material
APPLIED MATERIALS INC0 citations61
US12027374B2Jul 2, 2024
Processes to deposit amorphous-silicon etch protection liner
APPLIED MATERIALS INC0 citations60
US11994800B2May 28, 2024
Dose reduction of patterned metal oxide photoresists
APPLIED MATERIALS INC0 citations60
US11560626B2Jan 24, 2023
Substrate processing chamber
APPLIED MATERIALS INC0 citations60
US12334394B2Jun 17, 2025
Methods and apparatus for selective etch stop capping and selective via open for fully landed via on underlying metal
APPLIED MATERIALS INC0 citations59
US11217443B2Jan 4, 2022
Sequential deposition and high frequency plasma treatment of deposited film on patterned and un-patterned substrates
APPLIED MATERIALS INC0 citations59