Inventor
CHEN XIAOLIN C
US6 patents
Patents
6 patentsUS6908862B2Jun 21, 2005
HDP-CVD dep/etch/dep process for improved deposition into high aspect ratio features
APPLIED MATERIALS INC277 citations97
US12087595B2Sep 10, 2024
Metal deposition and etch in high aspect-ratio features
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US11798813B2Oct 24, 2023
Selective removal of ruthenium-containing materials
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US11631589B2Apr 18, 2023
Metal etch in high aspect-ratio features
APPLIED MATERIALS INC0 citations58
US12272563B2Apr 8, 2025
Metal oxide directional removal
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US11984325B2May 14, 2024
Selective removal of transition metal nitride materials
APPLIED MATERIALS INC0 citations47