Inventor
ARAI SOICHIRO
JP23 patents
⚠️ This page may combine multiple inventors who share the name “ARAI SOICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
19 patentsUS5369282ANov 29, 1994
Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput
FUJITSU LTD143 citations98
US6646275B2Nov 11, 2003
Charged particle beam exposure system and method
FUJITSU LTD43 citations96
US6118129ASep 12, 2000
Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements
FUJITSU LTD30 citations96
US5977548ANov 2, 1999
Charged particle beam exposure system and method
FUJITSU LTD28 citations96
US5841145ANov 24, 1998
Method of and system for exposing pattern on object by charged particle beam
FUJITSU LTD60 citations96
US5614725AMar 25, 1997
Charged particle beam exposure system and method
FUJITSU LTD36 citations96
US5528048AJun 18, 1996
Charged particle beam exposure system and method
FUJITSU LTD47 citations96
US6064807AMay 16, 2000
Charged-particle beam exposure system and method
FUJITSU LTD77 citations94
US6072185AJun 6, 2000
Charged-particle-beam exposure device and method capable of high-speed data reading
FUJITSU LTD29 citations92
US5920077AJul 6, 1999
Charged particle beam exposure system
FUJITSU LTD21 citations92
US5866300AFeb 2, 1999
Method of and system for exposing pattern on object by charged particle beam
FUJITSU LTD25 citations92
US5719402AFeb 17, 1998
Method of and system for charged particle beam exposure
FUJITSU LTD32 citations92
US5546319AAug 13, 1996
Method of and system for charged particle beam exposure
FUJITSU LTD21 citations92
US5401974AMar 28, 1995
Charged particle beam exposure apparatus and method of cleaning the same
FUJITSU LTD47 citations92
US5399872AMar 21, 1995
Charged-particle beam exposure method
FUJITSU LTD51 citations92
US5910658AJun 8, 1999
Method and system for changed particle beam exposure
FUJITSU LTD18 citations83
US5965895AOct 12, 1999
Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure
FUJITSU LTD13 citations82
US5721432AFeb 24, 1998
Method of and system for charged particle beam exposure
FUJITSU LTD16 citations82
US6057907AMay 2, 2000
Method of and system for exposing pattern on object by charged particle beam
FUJITSU LTD12 citations74