Inventor
CHENG YANA
US15 patents
⚠️ This page may combine multiple inventors who share the name “CHENG YANA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
10 patentsUS10109520B2Oct 23, 2018
Methods for depositing dielectric barrier layers and aluminum containing etch stop layers
APPLIED MATERIALS INC2 citations72
US9633839B2Apr 25, 2017
Methods for depositing dielectric films via physical vapor deposition processes
APPLIED MATERIALS INC2 citations72
US9601431B2Mar 21, 2017
Dielectric/metal barrier integration to prevent copper diffusion
APPLIED MATERIALS INC4 citations72
US9299605B2Mar 29, 2016
Methods for forming passivation protection for an interconnection structure
APPLIED MATERIALS INC3 citations72
US9984976B2May 29, 2018
Interconnect structures and methods of formation
APPLIED MATERIALS INC2 citations71
US11056325B2Jul 6, 2021
Methods and apparatus for substrate edge uniformity
APPLIED MATERIALS INC0 citations59
US10707122B2Jul 7, 2020
Methods for depositing dielectric barrier layers and aluminum containing etch stop layers
APPLIED MATERIALS INC0 citations51
US10665426B2May 26, 2020
Methods for thin film material deposition using reactive plasma-free physical vapor deposition
APPLIED MATERIALS INC0 citations51
US10546742B2Jan 28, 2020
Method to reduce trap-induced capacitance in interconnect dielectric barrier stack
APPLIED MATERIALS INC0 citations51
US10170299B2Jan 1, 2019
Method to reduce trap-induced capacitance in interconnect dielectric barrier stack
APPLIED MATERIALS INC0 citations51
ASML NETHERLANDS BV
5 patentsUS12044980B2Jul 23, 2024
Method of manufacturing devices
ASML NETHERLANDS BV3 citations72
US12055904B2Aug 6, 2024
Method to predict yield of a device manufacturing process
ASML NETHERLANDS BV2 citations71
US11803127B2Oct 31, 2023
Method for determining root cause affecting yield in a semiconductor manufacturing process
ASML NETHERLANDS BV3 citations71
US11947266B2Apr 2, 2024
Method for controlling a manufacturing process and associated apparatuses
ASML NETHERLANDS BV5 citations70
US11754931B2Sep 12, 2023
Method for determining corrections for lithographic apparatus
ASML NETHERLANDS BV0 citations58