Inventor
OLMO MASSIMILIANO
IT15 patents
⚠️ This page may combine multiple inventors who share the name “OLMO MASSIMILIANO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MEMC ELECTRONIC MATERIALS
8 patentsUS6190631B1Feb 20, 2001
Low defect density, ideal oxygen precipitating silicon
MEMC ELECTRONIC MATERIALS40 citations95
US6180220B1Jan 30, 2001
Ideal Oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor
MEMC ELECTRONIC MATERIALS59 citations95
US6586068B1Jul 1, 2003
Ideal oxygen precipitating silicon wafer having an asymmetrical vacancy concentration profile and a process for the preparation thereof
MEMC ELECTRONIC MATERIALS19 citations92
US7442253B2Oct 28, 2008
Process for forming low defect density, ideal oxygen precipitating silicon
MEMC ELECTRONIC MATERIALS6 citations73
US6896728B2May 24, 2005
Process for producing low defect density, ideal oxygen precipitating silicon
MEMC ELECTRONIC MATERIALS11 citations73
US6849119B2Feb 1, 2005
Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor
MEMC ELECTRONIC MATERIALS5 citations73
US6555194B1Apr 29, 2003
Process for producing low defect density, ideal oxygen precipitating silicon
MEMC ELECTRONIC MATERIALS4 citations73
US7229693B2Jun 12, 2007
Low defect density, ideal oxygen precipitating silicon
MEMC ELECTRONIC MATERIALS2 citations62
MEMC ELECTRONIC MATERIALS SPA
6 patentsUS5994761ANov 30, 1999
Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor
MEMC ELECTRONIC MATERIALS SPA122 citations98
US6306733B1Oct 23, 2001
Ideal oxygen precipitating epitaxial silicon wafers and oxygen out-diffusion-less process therefor
MEMC ELECTRONIC MATERIALS SPA33 citations95
US6204152B1Mar 20, 2001
Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor
MEMC ELECTRONIC MATERIALS SPA43 citations95
US5403406AApr 4, 1995
Silicon wafers having controlled precipitation distribution
MEMC ELECTRONIC MATERIALS SPA99 citations93
US5401669AMar 28, 1995
Process for the preparation of silicon wafers having controlled distribution of oxygen precipitate nucleation centers
MEMC ELECTRONIC MATERIALS SPA101 citations93
US6537368B2Mar 25, 2003
Ideal oxygen precipitating epitaxial silicon wafers and oxygen out-diffusion-less process therefor
MEMC ELECTRONIC MATERIALS SPA18 citations92