Inventor
MASON CHRISTOPHER J
US6 patents
Patents
6 patentsUS6859260B2Feb 22, 2005
Method and system for improving focus accuracy in a lithography system
ASML HOLDING NV12 citations81
US7102733B2Sep 5, 2006
System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool
ASML HOLDING NV8 citations72
US7180573B2Feb 20, 2007
System and method to block unwanted light reflecting from a pattern generating portion from reaching an object
ASML HOLDING NV6 citations61
US7248336B2Jul 24, 2007
Method and system for improving focus accuracy in a lithography system
ASML HOLDING NV1 citations60
US7053984B2May 30, 2006
Method and systems for improving focus accuracy in a lithography system
ASML HOLDING NV3 citations60
US7153616B2Dec 26, 2006
System and method for verifying and controlling the performance of a maskless lithography tool
ASML HOLDING NV4 citations59