Inventor

TABARA SUGURU

JP26 patents

⚠️ This page may combine multiple inventors who share the name “TABARA SUGURU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TABARA SUGURU

YAMAHA CORP

Method for manufacturing a semiconductor device using antireflection coating

Wiring forming method

Manufacture of semiconductor device with fine patterns

Semiconductor device with multi-layer wiring

Measurement of electron shading damage

Method of forming wiring pattern

Method of manufacturing a semiconductor device using antireflection coating

Manufacture of semiconductor device with fine pattens

Metal plug with adhesion layer

Method of making a wiring layer wherein the masking material is ashed using an alcohol containing plasma

Dry etching suppressing formation of notch

Method of measuring electron shading damage

Multilayer aluminum wiring in semiconductor IC

Method of forming multilayer aluminum wiring in semiconductor IC

Method of manufacturing semiconductor device

Method of measuring electron shading damage

Interconnection with metal plug and reduced step

Controlled taper etching

Dry etching with less particles

Method of etching polysilicon using a thin oxide mask formed on the polysilicon while doping

Conductive layer forming method using etching mask with direction &lt;200&gt;

Semiconductor manufacture method with aluminum wiring layer patterning process

Method of forming an interconnection with metal plug and reduced step

Wiring forming method

Wiring forming method

ROHM CO LTD

Method of manufacturing semiconductor device

Conductive layer forming method using etching mask with direction <200>