Inventor
SIMONS JOHN P
US36 patents
⚠️ This page may combine multiple inventors who share the name “SIMONS JOHN P”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
30 patentsUS6561220B2May 13, 2003
Apparatus and method for increasing throughput in fluid processing
IBM71 citations96
US7361444B1Apr 22, 2008
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
IBM22 citations92
US6838015B2Jan 4, 2005
Liquid or supercritical carbon dioxide composition
IBM20 citations92
US6683008B1Jan 27, 2004
Process of removing ion-implanted photoresist from a workpiece
IBM19 citations92
US6656666B2Dec 2, 2003
Topcoat process to prevent image collapse
IBM27 citations92
US6622507B2Sep 23, 2003
Electromechanical device and a process of preparing same
IBM27 citations92
US6509136B1Jan 21, 2003
Process of drying a cast polymeric film disposed on a workpiece
IBM21 citations92
US6454869B1Sep 24, 2002
Process of cleaning semiconductor processing, handling and manufacturing equipment
IBM24 citations92
US6451375B1Sep 17, 2002
Process for depositing a film on a nanometer structure
IBM33 citations92
US6425956B1Jul 30, 2002
Process for removing chemical mechanical polishing residual slurry
IBM44 citations92
US6398875B1Jun 4, 2002
Process of drying semiconductor wafers using liquid or supercritical carbon dioxide
IBM53 citations92
US5593812AJan 14, 1997
Photoresist having increased sensitivity and use thereof
IBM18 citations92
US6834671B2Dec 28, 2004
Check valve for micro electro mechanical structure devices
IBM19 citations84
US6736906B2May 18, 2004
Turbine part mount for supercritical fluid processor
IBM16 citations84
US6875286B2Apr 5, 2005
Solid CO2 cleaning
IBM15 citations82
US7081208B2Jul 25, 2006
Method to build a microfilter
IBM9 citations74
US6927393B2Aug 9, 2005
Method of in situ monitoring of supercritical fluid process conditions
IBM8 citations74
US6890855B2May 10, 2005
Process of removing residue material from a precision surface
IBM9 citations74
US6457480B1Oct 1, 2002
Process and apparatus for cleaning filters
IBM9 citations74
US7709177B2May 4, 2010
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
IBM7 citations73
US7288155B2Oct 30, 2007
Method for the rapid thermal control of a work piece in liquid or supercritical fluid
IBM3 citations63
US6821488B1Nov 23, 2004
Sample holding chuck for use in reactor and reactor using same
IBM4 citations63
US6739346B2May 25, 2004
Apparatus for cleaning filters
IBM4 citations63
US6653233B2Nov 25, 2003
Process of providing a semiconductor device with electrical interconnection capability
IBM6 citations63
US6579464B2Jun 17, 2003
Fixtures for processing a workpiece in a supercritical fluid
IBM4 citations63
US7736833B2Jun 15, 2010
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
IBM3 citations62
US6997197B2Feb 14, 2006
Apparatus and method for rapid thermal control of a workpiece in liquid or dense phase fluid
IBM0 citations52
US7485964B2Feb 3, 2009
Dielectric material
IBM0 citations51
US7332436B2Feb 19, 2008
Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition
IBM0 citations51
US7056837B2Jun 6, 2006
Process of insulating a semiconductor device using a polymeric material
IBM1 citations51