Inventor · disambiguated record
Shigeru Matake
Also filed as: MATAKE SHIGERU
27 granted patents·5 pending applications·428 citations·filing 1979–2016
96Inventor score
Top patents by PatentIndex Score
32 records- 0191US6709806B2Method of forming composite memberTOSHIBA KK·Filed 2001·Granted Mar 23, 2004·38 cites·51 claims
- 0288US6835889B2Passive element component and substrate with built-in passive elementTOSHIBA KK·Filed 2002·Granted Dec 28, 2004·38 cites·15 claims
- 0387US5756650APolyimide precursor composition, method of forming polyimide film, electronic parts and liquid crystal elementTOSHIBA KK·Filed 1997·Granted May 26, 1998·68 cites·20 claims
- 0484US4428916AMethod of making α-silicon nitride powderTOKYO SHIBAURA ELECTRIC CO·Filed 1979·Granted Jan 31, 1984·22 cites·15 claims
- 0583US6899999B2Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite memberTOSHIBA KK·Filed 2002·Granted May 31, 2005·21 cites·19 claims
- 0682US6316170B2Developing solution and method of forming polyimide pattern by using the developing solutionTOSHIBA KK·Filed 2000·Granted Nov 13, 2001·20 cites·20 claims
- 0781US5348835APhotosensitive resin composition for forming polyimide film pattern comprising an o-quinone diazide photosensitive agentTOSHIBA KK·Filed 1991·Granted Sep 20, 1994·33 cites·7 claims
- 0879US5518864AMethod of forming polyimide film patternTOSHIBA KK·Filed 1994·Granted May 21, 1996·31 cites·12 claims
- 0977US9419152B2Carbon electrode, carbon electrode production method, and photoelectric conversion deviceTOSHIBA KK·Filed 2013·Granted Aug 16, 2016·3 cites·16 claims
- 1077US6649516B2Method for manufacturing a composite member from a porous substrate by selectively infiltrating conductive material into the substrate to form via and wiring regionsTOSHIBA KK·Filed 2002·Granted Nov 18, 2003·21 cites·20 claims
- 1176US9159463B2Conductive materialNAITO KATSUYUKI·Filed 2012·Granted Oct 13, 2015·4 cites·20 claims
- 1275US6906423B1Mask used for exposing a porous substrateTOSHIBA KK·Filed 2003·Granted Jun 14, 2005·18 cites·5 claims
- 1374US5578697APolyimide precursor, bismaleimide-based cured resin precursor and electronic parts having insulating members made from these precursorsTOSHIBA KK·Filed 1995·Granted Nov 26, 1996·48 cites·20 claims
- 1473US7370412B2Method for connecting electronic deviceTOSHIBA KK·Filed 2003·Granted May 13, 2008·21 cites·6 claims
- 1567US7329458B2Wiring member and method of manufacturing the sameTOSHIBA KK·Filed 2003·Granted Feb 12, 2008·15 cites·36 claims
- 1662US9276269B2Catalyst layer, membrane electrode assembly, and electrochemical cellMEI WU·Filed 2012·Granted Mar 1, 2016·0 cites·12 claims
- 1762US2015083211A1Photoelectric Conversion Layer and Applications Thereof to Solar Cell, Photodiode and Image SensorTOSHIBA KK·Filed 2014·Application pending·0 cites
- 1860US9364820B2Oxygen reduction catalyst and electrochemical cellTOSHIBA KK·Filed 2013·Granted Jun 14, 2016·0 cites·17 claims
- 1960US2016141631A1Catalyst layer, membrane electrode assembly, and electrochemical cellTOSHIBA KK·Filed 2016·Application pending·0 cites
- 2056US10644325B2Porous catalyst layer, membrane electrode assembly, and electrochemical cellTOSHIBA KK·Filed 2016·Granted May 5, 2020·0 cites·14 claims
- 2156US10214822B2Electrode, membrane electrode assembly, electrochemical cell, and stackTOSHIBA KK·Filed 2016·Granted Feb 26, 2019·0 cites·13 claims
- 2256US9865882B2Noble metal catalyst layer, membrane electrode assembly, and method for producing noble metal catalyst layerTOSHIBA KK·Filed 2013·Granted Jan 9, 2018·0 cites·18 claims
- 2353US8355204B2Light-extraction layer of light-emitting device and organic electroluminescence element employing the sameTOSHIBA KK·Filed 2008·Granted Jan 15, 2013·0 cites·14 claims
- 2453US2014134521A1Carbon material, method of manufacturing the same, and electrochemical cell using the sameTOSHIBA KK·Filed 2013·Application pending·0 cites
- 2551US7312621B2Semiconductor test unit having low contact resistance with examined electronic products, semiconductor contact board, method for testing semiconductor device, semiconductor device, and method for manufacturing thereofTOSHIBA KK·Filed 2003·Granted Dec 25, 2007·5 cites·12 claims
- 2646US10573897B2Catalyst layer, method for producing the same, membrane electrode assembly and electrochemical cellTOSHIBA KK·Filed 2015·Granted Feb 25, 2020·0 cites·12 claims
- 2745US7414417B2Contact sheet for testing electronic parts, apparatus for testing electronic parts, method for testing electronic parts, method for manufacturing electronic parts and electronic partsTOSHIBA KK·Filed 2004·Granted Aug 19, 2008·2 cites·15 claims
- 2845US2017204526A1Electrode, electrochemical cell, electrochemical apparatus and method for manufacturing electrodeTOSHIBA KK·Filed 2016·Application pending·0 cites
- 2940US4598979AElectrochromic display deviceTOKYO SHIBAURA ELECTRIC CO·Filed 1983·Granted Jul 8, 1986·8 cites·21 claims
- 3040US4404268ASolid state lithium cellTOKYO SHIBAURA ELECTRIC CO·Filed 1981·Granted Sep 13, 1983·7 cites·8 claims
- 3137US2010183866A1Method for producing a particle-arranged structureFUJIMOTO AKIRA·Filed 2010·Application pending·0 cites
- 3235US5242731AResin composition for an optical disc and an optical disc using itTOSHIBA KK·Filed 1991·Granted Sep 7, 1993·5 cites·8 claims
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