Inventor
ROBERTS JOHN V H
US42 patents
⚠️ This page may combine multiple inventors who share the name “ROBERTS JOHN V H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
RODEL INC
33 patentsUS6022268AFeb 8, 2000
Polishing pads and methods relating thereto
RODEL INC157 citations99
US5605760AFeb 25, 1997
Polishing pads
RODEL INC424 citations99
US4959113ASep 25, 1990
Method and composition for polishing metal surfaces
RODEL INC201 citations99
US6171181B1Jan 9, 2001
Molded polishing pad having integral window
RODEL INC165 citations98
US6017265AJan 25, 2000
Methods for using polishing pads
RODEL INC186 citations98
US6749485B1Jun 15, 2004
Hydrolytically stable grooved polishing pads for chemical mechanical planarization
RODEL INC98 citations97
US6736709B1May 18, 2004
Grooved polishing pads for chemical mechanical planarization
RODEL INC96 citations97
US6069080AMay 30, 2000
Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like
RODEL INC126 citations97
US5900164AMay 4, 1999
Method for planarizing a semiconductor device surface with polymeric pad containing hollow polymeric microelements
RODEL INC141 citations97
US5578362ANov 26, 1996
Polymeric polishing pad containing hollow polymeric microelements
RODEL INC433 citations97
US5264010ANov 23, 1993
Compositions and methods for polishing and planarizing surfaces
RODEL INC172 citations97
US5257478ANov 2, 1993
Apparatus for interlayer planarization of semiconductor material
RODEL INC311 citations97
US6488570B1Dec 3, 2002
Method relating to a polishing system having a multi-phase polishing layer
RODEL INC68 citations96
US6375559B1Apr 23, 2002
Polishing system having a multi-phase polishing substrate and methods relating thereto
RODEL INC61 citations96
US6099394AAug 8, 2000
Polishing system having a multi-phase polishing substrate and methods relating thereto
RODEL INC82 citations96
US6019666AFeb 1, 2000
Mosaic polishing pads and methods relating thereto
RODEL INC69 citations96
US5489233AFeb 6, 1996
Polishing pads and methods for their use
RODEL INC479 citations96
US6439989B1Aug 27, 2002
Polymeric polishing pad having continuously regenerated work surface
RODEL INC39 citations95
US6387312B1May 14, 2002
Molding a polishing pad having integral window
RODEL INC56 citations95
US6231434B1May 15, 2001
Polishing pads and methods relating thereto
RODEL INC44 citations95
US6676483B1Jan 13, 2004
Anti-scattering layer for polishing pad windows
RODEL INC28 citations93
US6517417B2Feb 11, 2003
Polishing pad with a transparent portion
RODEL INC38 citations93
US6375694B1Apr 23, 2002
Polishing slurry compositions capable of providing multi-modal particle packing
RODEL INC19 citations93
US6093649AJul 25, 2000
Polishing slurry compositions capable of providing multi-modal particle packing and methods relating thereto
RODEL INC43 citations93
US6648733B2Nov 18, 2003
Polishing pads and methods relating thereto
RODEL INC45 citations92
US6425816B1Jul 30, 2002
Polishing pads and methods relating thereto
RODEL INC24 citations92
US6337281B1Jan 8, 2002
Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like
RODEL INC44 citations92
US6325703B2Dec 4, 2001
Polishing pads and methods relating thereto
RODEL INC23 citations92
US6287185B1Sep 11, 2001
Polishing pads and methods relating thereto
RODEL INC27 citations92
US6106754AAug 22, 2000
Method of making polishing pads
RODEL INC35 citations92
US6245679B1Jun 12, 2001
Apparatus and methods for chemical-mechanical polishing of semiconductor wafers
RODEL INC13 citations74
US6210525B1Apr 3, 2001
Apparatus and methods for chemical-mechanical polishing of semiconductor wafers
RODEL INC14 citations74
US6739962B2May 25, 2004
Polishing pads and methods relating thereto
RODEL INC9 citations73
ROHM & HAAS ELECT MAT
8 patentsUS6984163B2Jan 10, 2006
Polishing pad with high optical transmission window
ROHM & HAAS ELECT MAT96 citations98
US6848977B1Feb 1, 2005
Polishing pad for electrochemical mechanical polishing
ROHM & HAAS ELECT MAT94 citations98
US6899611B2May 31, 2005
Polishing pad for a semiconductor device having a dissolvable substance
ROHM & HAAS ELECT MAT32 citations95
US7537446B2May 26, 2009
Apparatus for forming a porous reaction injection molded chemical mechanical polishing pad
ROHM & HAAS ELECT MAT32 citations93
US7101275B2Sep 5, 2006
Resilient polishing pad for chemical mechanical polishing
ROHM & HAAS ELECT MAT25 citations86
US7018581B2Mar 28, 2006
Method of forming a polishing pad with reduced stress window
ROHM & HAAS ELECT MAT28 citations86
US7435364B2Oct 14, 2008
Method for forming a porous polishing pad
ROHM & HAAS ELECT MAT15 citations84
US6903021B2Jun 7, 2005
Method of polishing a semiconductor device
ROHM & HAAS ELECT MAT6 citations72