Inventor
HO CHIN-HSIUNG
US12 patents
Patents
12 patentsUS6037204AMar 14, 2000
Silicon and arsenic double implanted pre-amorphization process for salicide technology
TAIWAN SEMICONDUCTOR MFG94 citations97
US6020255AFeb 1, 2000
Dual damascene interconnect process with borderless contact
TAIWAN SEMICONDUCTOR MFG105 citations97
US6083824AJul 4, 2000
Borderless contact
TAIWAN SEMICONDUCTOR MFG56 citations96
US6063695AMay 16, 2000
Simplified process for the fabrication of deep clear laser marks using a photoresist mask
TAIWAN SEMICONDUCTOR MFG57 citations94
US5674775AOct 7, 1997
Isolation trench with a rounded top edge using an etch buffer layer
TAIWAN SEMICONDUCTOR MFG79 citations94
US6057207AMay 2, 2000
Shallow trench isolation process using chemical-mechanical polish with self-aligned nitride mask on HDP-oxide
TAIWAN SEMICONDUCTOR MFG45 citations92
US5821153AOct 13, 1998
Method to reduce field oxide loss from etches
TAIWAN SEMICONDUCTOR MFG20 citations92
US6555477B1Apr 29, 2003
Method for preventing Cu CMP corrosion
TAIWAN SEMICONDUCTOR MFG33 citations91
US6207538B1Mar 27, 2001
Method for forming n and p wells in a semiconductor substrate using a single masking step
TAIWAN SEMICONDUCTOR MFG14 citations73
US6103581AAug 15, 2000
Method for producing shallow trench isolation structure
TAIWAN SEMICONDUCTOR MFG12 citations73
US6716740B2Apr 6, 2004
Method for depositing silicon oxide incorporating an outgassing step
TAIWAN SEMICONDUCTOR MFG6 citations60
US6647998B2Nov 18, 2003
Electrostatic charge-free solvent-type dryer for semiconductor wafers
TAIWAN SEMICONDUCTOR MFG0 citations46