Inventor
YEH MATT
TW22 patents
⚠️ This page may combine multiple inventors who share the name “YEH MATT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
12 patentsUS8361848B2Jan 29, 2013
Precise resistor on a semiconductor device
TAIWAN SEMICONDUCTOR MFG24 citations92
US8048733B2Nov 1, 2011
Method for fabricating a gate structure
TAIWAN SEMICONDUCTOR MFG29 citations90
US7732344B1Jun 8, 2010
High selectivity etching process for metal gate N/P patterning
TAIWAN SEMICONDUCTOR MFG26 citations90
US8367563B2Feb 5, 2013
Methods for a gate replacement process
TAIWAN SEMICONDUCTOR MFG5 citations84
US8361855B2Jan 29, 2013
Method for fabricating a gate structure
TAIWAN SEMICONDUCTOR MFG15 citations82
US8658525B2Feb 25, 2014
Methods for a gate replacement process
TAIWAN SEMICONDUCTOR MFG2 citations63
US7713854B2May 11, 2010
Gate dielectric layers and methods of fabricating gate dielectric layers
TAIWAN SEMICONDUCTOR MFG3 citations63
US8357617B2Jan 22, 2013
Method of patterning a metal gate of semiconductor device
TAIWAN SEMICONDUCTOR MFG1 citations62
US7915105B2Mar 29, 2011
Method for patterning a metal gate
TAIWAN SEMICONDUCTOR MFG5 citations62
US9362124B2Jun 7, 2016
Method of patterning a metal gate of semiconductor device
TAIWAN SEMICONDUCTOR MFG0 citations52
US8993452B2Mar 31, 2015
Method of patterning a metal gate of semiconductor device
TAIWAN SEMICONDUCTOR MFG0 citations52
US7727900B2Jun 1, 2010
Surface preparation for gate oxide formation that avoids chemical oxide formation
TAIWAN SEMICONDUCTOR MFG0 citations52
YEH MATT
6 patentsUS8415254B2Apr 9, 2013
Method for removing dummy poly in a gate last process
YEH MATT19 citations91
US8110490B2Feb 7, 2012
Gate oxide leakage reduction
YEH MATT5 citations62
US8268085B2Sep 18, 2012
Methods for forming metal gate transistors
YEH MATT2 citations61
US8569185B2Oct 29, 2013
Method of fabricating gate electrode using a treated hard mask
YEH MATT0 citations51
US8173504B2May 8, 2012
Method of fabricating gate electrode using a treated hard mask
YEH MATT0 citations51
US8980706B2Mar 17, 2015
Double treatment on hard mask for gate N/P patterning
YEH MATT0 citations40
LEE DA-YUAN
3 patentsUS8329546B2Dec 11, 2012
Modified profile gate structure for semiconductor device and methods of forming thereof
LEE DA-YUAN22 citations91
US8334197B2Dec 18, 2012
Method of fabricating high-k/metal gate device
LEE DA-YUAN13 citations84
US8222132B2Jul 17, 2012
Fabricating high-K/metal gate devices in a gate last process
LEE DA-YUAN12 citations83