Inventor
YONEDA EIJI
JP22 patents
⚠️ This page may combine multiple inventors who share the name “YONEDA EIJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
6 patentsUS6908722B2Jun 21, 2005
Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition
JSR CORP200 citations98
US7897821B2Mar 1, 2011
Sulfonium compound
JSR CORP15 citations92
US7812105B2Oct 12, 2010
Compound, polymer, and radiation-sensitive composition
JSR CORP25 citations92
US7217492B2May 15, 2007
Onium salt compound and radiation-sensitive resin composition
JSR CORP17 citations84
US6824954B2Nov 30, 2004
Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same
JSR CORP4 citations62
US7314701B2Jan 1, 2008
Radiation-sensitive resin composition
JSR CORP0 citations37
MITSUBISHI NUCLEAR FUEL
6 patentsUS5374800ADec 20, 1994
Method for welding of fuel rod
MITSUBISHI NUCLEAR FUEL22 citations92
US5968375AOct 19, 1999
Method for welding and apparatus therefor
MITSUBISHI NUCLEAR FUEL11 citations73
US5401933AMar 28, 1995
Method for welding of end plug of control rod
MITSUBISHI NUCLEAR FUEL11 citations73
US5319178AJun 7, 1994
Welding apparatus for fuel rod end plugs
MITSUBISHI NUCLEAR FUEL11 citations73
US6272203B1Aug 7, 2001
X-ray fluorescence inspection apparatus
MITSUBISHI NUCLEAR FUEL4 citations62
US6103996AAug 15, 2000
Method for producing a fuel rod
MITSUBISHI NUCLEAR FUEL5 citations54
TOSHIBA KK
4 patentsUS9465295B2Oct 11, 2016
Pattern forming method
TOSHIBA KK2 citations60
US9260300B2Feb 16, 2016
Pattern formation method and pattern formation apparatus
TOSHIBA KK1 citations52
US9209052B2Dec 8, 2015
Semiconductor manufacturing apparatus and device manufacturing method using substrate distortion correction
TOSHIBA KK1 citations51
US9349585B2May 24, 2016
Pattern formation method
TOSHIBA KK1 citations45