Inventor
WANG YUHOU
US20 patents
Patents
20 patentsUS10264663B1Apr 16, 2019
Matchless plasma source for semiconductor wafer fabrication
LAM RES CORP29 citations97
US10638593B2Apr 28, 2020
Matchless plasma source for semiconductor wafer fabrication
LAM RES CORP10 citations92
US11716805B2Aug 1, 2023
Matchless plasma source for semiconductor wafer fabrication
LAM RES CORP4 citations85
US11224116B2Jan 11, 2022
Matchless plasma source for semiconductor wafer fabrication
LAM RES CORP4 citations84
US11728136B2Aug 15, 2023
RF pulsing within pulsing for semiconductor RF plasma processing
LAM RES CORP2 citations73
US11342159B2May 24, 2022
RF pulsing within pulsing for semiconductor RF plasma processing
LAM RES CORP2 citations73
US10672590B2Jun 2, 2020
Frequency tuning for a matchless plasma source
LAM RES CORP3 citations73
US10957521B2Mar 23, 2021
Image based plasma sheath profile detection on plasma processing tools
LAM RES CORP6 citations72
US10879044B2Dec 29, 2020
Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsing
LAM RES CORP2 citations72
US12507338B2Dec 23, 2025
Matchless plasma source for semiconductor wafer fabrication
LAM RES CORP0 citations62
US12490370B2Dec 2, 2025
Matchless plasma source for semiconductor wafer fabrication
LAM RES CORP0 citations62
US12484139B2Nov 25, 2025
Matchless plasma source for semiconductor wafer fabrication
LAM RES CORP0 citations62
US12471202B2Nov 11, 2025
Matchless plasma source for semiconductor wafer fabrication
LAM RES CORP0 citations62
US12424410B2Sep 23, 2025
RF pulsing within pulsing for semiconductor RF plasma processing
LAM RES CORP0 citations62
US12261029B2Mar 25, 2025
Protection system for switches in direct drive circuits of substrate processing systems
LAM RES CORP0 citations62
US12193138B2Jan 7, 2025
Matchless plasma source for semiconductor wafer fabrication
LAM RES CORP0 citations62
US12165841B2Dec 10, 2024
Dual-frequency, direct-drive inductively coupled plasma source
LAM RES CORP0 citations62
US11728137B2Aug 15, 2023
Direct frequency tuning for matchless plasma source in substrate processing systems
LAM RES CORP1 citations62
US11437219B2Sep 6, 2022
Frequency tuning for a matchless plasma source
LAM RES CORP0 citations62
US12397435B2Aug 26, 2025
Substrate location detection and adjustment
LAM RES CORP0 citations51