Inventor
HAAG WALTER
CH29 patents
⚠️ This page may combine multiple inventors who share the name “HAAG WALTER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
BALZERS HOCHVAKUUM
10 patentsUS6176979B1Jan 23, 2001
Method of manufacturing an object in a vacuum recipient
BALZERS HOCHVAKUUM19 citations92
US6068742AMay 30, 2000
Target arrangement with a circular plate, magnetron for mounting the target arrangement, and process for coating a series of circular disc-shaped workpieces by means of said magnetron source
BALZERS HOCHVAKUUM35 citations92
US5490913AFeb 13, 1996
Magnetic field enhanced sputtering arrangement with vacuum treatment apparatus
BALZERS HOCHVAKUUM31 citations90
US5753089AMay 19, 1998
Sputter coating station
BALZERS HOCHVAKUUM17 citations84
US5688381ANov 18, 1997
Magnetron atomization source and method of use thereof
BALZERS HOCHVAKUUM17 citations81
US4619748AOct 28, 1986
Method and apparatus for the reactive vapor deposition of layers of oxides, nitrides, oxynitrides and carbides on a substrate
BALZERS HOCHVAKUUM24 citations81
US5833823ANov 10, 1998
Sputter source with a target arrangement and a holding device
BALZERS HOCHVAKUUM18 citations80
US6149783ANov 21, 2000
Vacuum treatment apparatus
BALZERS HOCHVAKUUM6 citations73
US5997697ADec 7, 1999
Magnetron sputtering source and method of use thereof
BALZERS HOCHVAKUUM10 citations71
US5733419AMar 31, 1998
Vacuum treatment chamber
BALZERS HOCHVAKUUM3 citations62
UNAXIS BALZERS AG
3 patentsUS6337001B1Jan 8, 2002
Process for sputter coating, a sputter coating source, and sputter coating apparatus with at least one such source
UNAXIS BALZERS AG44 citations92
US6776881B2Aug 17, 2004
Magnetron atomization source and method of use thereof
UNAXIS BALZERS AG2 citations61
US6540883B1Apr 1, 2003
Magnetron sputtering source and method of use thereof
UNAXIS BALZERS AG3 citations60