Inventor
RANA NIRAJ B
US18 patents
⚠️ This page may combine multiple inventors who share the name “RANA NIRAJ B”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
14 patentsUS7557013B2Jul 7, 2009
Methods of forming a plurality of capacitors
MICRON TECHNOLOGY INC70 citations97
US7683021B2Mar 23, 2010
Methods of removing metal-containing materials
MICRON TECHNOLOGY INC4 citations73
US7244682B2Jul 17, 2007
Methods of removing metal-containing materials
MICRON TECHNOLOGY INC7 citations73
US7109089B2Sep 19, 2006
Semiconductor fabrication using a collar
MICRON TECHNOLOGY INC7 citations73
US9159780B2Oct 13, 2015
Methods of forming capacitors
MICRON TECHNOLOGY INC2 citations62
US7683020B2Mar 23, 2010
Methods of removing metal-containing materials
MICRON TECHNOLOGY INC2 citations62
US7541635B2Jun 2, 2009
Semiconductor fabrication using a collar
MICRON TECHNOLOGY INC2 citations62
US7713885B2May 11, 2010
Methods of etching oxide, reducing roughness, and forming capacitor constructions
MICRON TECHNOLOGY INC0 citations52
US7683022B2Mar 23, 2010
Methods of removing metal-containing materials
MICRON TECHNOLOGY INC0 citations51
US7642196B2Jan 5, 2010
Semiconductor fabrication processes
MICRON TECHNOLOGY INC0 citations51
US7368416B2May 6, 2008
Methods of removing metal-containing materials
MICRON TECHNOLOGY INC0 citations51
US8969217B2Mar 3, 2015
Methods of treating semiconductor substrates, methods of forming openings during semiconductor fabrication, and methods of removing particles from over semiconductor substrates
MICRON TECHNOLOGY INC0 citations49
US8026148B2Sep 27, 2011
Methods of utilizing silicon dioxide-containing masking structures
MICRON TECHNOLOGY INC0 citations48
US9087737B2Jul 21, 2015
Methods of forming charge storage structures including etching diffused regions to form recesses
MICRON TECHNOLOGY INC0 citations47