Inventor
TSUEI CHERNG-CHANG
TW12 patents
⚠️ This page may combine multiple inventors who share the name “TSUEI CHERNG-CHANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
6 patentsUS6423175B1Jul 23, 2002
Apparatus and method for reducing particle contamination in an etcher
TAIWAN SEMICONDUCTOR MFG70 citations95
US9147767B2Sep 29, 2015
Semiconductor structure and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG20 citations89
US6117349ASep 12, 2000
Composite shadow ring equipped with a sacrificial inner ring
TAIWAN SEMICONDUCTOR MFG51 citations88
US9064741B1Jun 23, 2015
Uniformity in wafer patterning using feedback control
TAIWAN SEMICONDUCTOR MFG3 citations61
US9324578B2Apr 26, 2016
Hard mask reshaping
TAIWAN SEMICONDUCTOR MFG0 citations51
US9362185B2Jun 7, 2016
Uniformity in wafer patterning using feedback control
TAIWAN SEMICONDUCTOR MFG0 citations50
TAIWAN SEMICONDUCTOR MFG CO LTD
6 patentsUS9559190B2Jan 31, 2017
Semiconductor structure and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations80
US9384949B2Jul 5, 2016
Gas-flow control method for plasma apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations56
US9087793B2Jul 21, 2015
Method for etching target layer of semiconductor device in etching apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US9613816B2Apr 4, 2017
Advanced process control method for controlling width of spacer and dummy sidewall in semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations44
US9177875B2Nov 3, 2015
Advanced process control method for controlling width of spacer and dummy sidewall in semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations44
US9412606B2Aug 9, 2016
Target dimension uniformity for semiconductor wafers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations41