P

Inventor

SAKAI KEI

JP30 patents
⚠️ This page may combine multiple inventors who share the name “SAKAI KEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI HIGH TECH CORP

21 patents
US10545017B2Jan 28, 2020

Overlay error measuring device and computer program for causing computer to measure pattern

HITACHI HIGH TECH CORP2 citations73
US9336587B2May 10, 2016

Semiconductor circuit pattern measuring apparatus and method

HITACHI HIGH TECH CORP5 citations72
US10620421B2Apr 14, 2020

Image-forming device, and dimension measurement device

HITACHI HIGH TECH CORP1 citations71
US11170969B2Nov 9, 2021

Electron beam observation device, electron beam observation system, and control method of electron beam observation device

HITACHI HIGH TECH CORP0 citations61
US10976536B2Apr 13, 2021

Image-forming device, and dimension measurement device

HITACHI HIGH TECH CORP0 citations61
US10417756B2Sep 17, 2019

Pattern measurement apparatus and defect inspection apparatus

HITACHI HIGH TECH CORP1 citations61
US10197783B2Feb 5, 2019

Image-forming device, and dimension measurement device

HITACHI HIGH TECH CORP1 citations61
US10984980B2Apr 20, 2021

Charged particle beam device for imaging vias inside trenches

HITACHI HIGH TECH CORP1 citations60
US11670481B2Jun 6, 2023

Charged particle beam device

HITACHI HIGH TECH CORP0 citations56
US11177112B2Nov 16, 2021

Pattern measurement device and non-transitory computer readable medium having stored therein program for executing measurement

HITACHI HIGH TECH CORP0 citations52
US11011346B2May 18, 2021

Electron beam device and image processing method

HITACHI HIGH TECH CORP0 citations52
US9589343B2Mar 7, 2017

Pattern measurement device, evaluation method of polymer compounds used in self-assembly lithography, and computer program

HITACHI HIGH TECH CORP0 citations51
US12505976B2Dec 23, 2025

Charged particle beam apparatus and method for calculating roughness index

HITACHI HIGH TECH CORP0 citations50
US12198327B2Jan 14, 2025

Measurement system, method for generating learning model to be used when performing image measurement of semiconductor including predetermined structure, and recording medium for storing program for causing computer to execute processing for generating learning model to be used when performing image measurement of semiconductor including predetermined structure

HITACHI HIGH TECH CORP0 citations50
US11791130B2Oct 17, 2023

Electron beam observation device, electron beam observation system, and image correcting method and method for calculating correction factor for image correction in electron beam observation device

HITACHI HIGH TECH CORP0 citations50
US11626266B2Apr 11, 2023

Charged particle beam device

HITACHI HIGH TECH CORP0 citations49
US12347074B2Jul 1, 2025

Pattern measurement system, pattern measurement method, and program for measuring edge roughness at the edge of a pattern based on a random noise component

HITACHI HIGH TECH CORP0 citations46
US12463005B2Nov 4, 2025

Correction coefficient calculation device, correction coefficient calculation method, and correction coefficient calculation program

HITACHI HIGH TECH CORP0 citations45
US12354829B2Jul 8, 2025

Overlay measurement system and overlay measurement device for overlay error measurement using electron microscopy

HITACHI HIGH TECH CORP0 citations41
US9831062B2Nov 28, 2017

Method for pattern measurement, method for setting device parameters of charged particle radiation device, and charged particle radiation device

HITACHI HIGH TECH CORP0 citations41
US10665420B2May 26, 2020

Charged particle beam apparatus

HITACHI HIGH TECH CORP0 citations38

MITSUBISHI HEAVY IND LTD

4 patents

SAKAI KEI

2 patents

SATOU KAZUYUKI

1 patent

IDEN HIROSHI

1 patent

ISHIJIMA TATSUAKI

1 patent