Inventor

KRAEHMER DANIEL

DE48 patents

⚠️ This page may combine multiple inventors who share the name “KRAEHMER DANIEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KRAEHMER DANIEL

ZEISS CARL SMT AG

Microlithographic exposure method as well as a projection exposure system for carrying out the method

Objective with lenses made of a crystalline material

Objective with fluoride crystal lenses

Microlithographic exposure method as well as a projection exposure system for carrying out the method

Projection exposure system

Projection exposure apparatus

Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus

Lithography projection objective, and a method for correcting image defects of the same

Method of determining lens materials for a projection exposure apparatus

Lithography projection objective, and a method for correcting image defects of the same

Objective with fluoride crystal lenses

Objective with birefringent lenses

Optical system and method for the production of micro-structured components by microlithography

Objective with lenses made of a crystalline material

Projection exposure apparatus and method for operating the same

Symmetrical objective having four lens groups for microlithography

Objective with fluoride crystal lenses

Projection optical system

Objective with crystal lenses

Microlithograph system

Objective with fluoride crystal lenses

Projection objective of a microlithographic projection exposure apparatus

Projection objective of a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH

Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a mask

Lithography projection objective, and a method for correcting image defects of the same

EUV light source for generating a usable output beam for a projection exposure apparatus

Collector

Illumination system for an EUV lithography device and facet mirror therefor

Polarization-modulating optical element and method for manufacturing thereof

Lithography projection objective, and a method for correcting image defects of the same

Illumination system or projection lens of a microlithographic exposure system

Lithography projection objective, and a method for correcting image defects of the same

Projection objective of a microlithographic projection exposure apparatus

Microlithography projection objective

Microlithography projection objective

High transmission, high aperture catadioptric projection objective and projection exposure apparatus

Optical system for a microlithographic projection exposure apparatus

MANN HANS-JUERGEN

Combination stop for catoptric projection arrangement

Combination stop for catoptric projection arrangement

KRAEHMER DANIEL

Polarization-modulating optical element and method for manufacturing thereof

Optical system for microlithography

TOTZECK MICHAEL

Optimization and matching of optical systems by use of orientation Zernike polynomials

LOERING ULRICH

Lithography projection objective, and a method for correcting image defects of the same

GOEHNERMEIER AKSEL

Projection objective for microlithography with stray light compensation and related methods

SCHUSTER KARL-HEINZ

Projection objective of a microlithographic projection exposure apparatus

ZEISS CARL SMS GMBH

Method for determining intensity distribution in the image plane of a projection exposure arrangement

GRUNER TORALF

Microlithographic exposure method as well as a projection exposure system for carrying out the method

KAMENOV VLADIMIR

Microlithographic projection exposure apparatus