Inventor

CHEN JANG FUNG

US90 patents

⚠️ This page may combine multiple inventors who share the name “CHEN JANG FUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHEN JANG FUNG

ASML MASKTOOLS BV

Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs

Method of two dimensional feature model calibration and optimization

Optical proximity correction

Method and apparatus for minimizing optical proximity effects

Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography

Method and apparatus for performing model-based layout conversion for use with dipole illumination

Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography

Method, program product and apparatus for performing double exposure lithography

Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography

Method of optical proximity correction design for contact hole mask

Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography

Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model

Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition model

Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems

Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM

Method of removing assist features utilized to improve process latitude

Hybrid phase-shift mask

Orientation dependent shielding for use with dipole illumination techniques

Method and apparatus for performing rule-based gate shrink utilizing dipole illumination

Method and apparatus for performing dark field double dipole lithography (DDL)

Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM

Method, program product and apparatus for generating assist features utilizing an image field map

Scattering bar OPC application method for sub-half wavelength lithography patterning

Automatic optical proximity correction (OPC) rule generation

Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs

Method of two dimensional feature model calibration and optimization

Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography

Method and apparatus for performing model-based layout conversion for use with dipole illumination

Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems

Method for performing transmission tuning of a mask pattern to improve process latitude

Orientation dependent shielding for use with dipole illumination techniques

Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation

Method and apparatus for performing dark field double dipole lithography (DDL)

Scattering bar OPC application method for sub-half wavelength lithography patterning

Scattering bar OPC application method for sub-half wavelength lithography patterning

Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model

Optical proximity correction

Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique

CHEN JANG FUNG

System and method for manufacturing multiple light emitting diodes in parallel

System and method for manufacturing three dimensional integrated circuits

Optical imaging writer system

Optical imaging writer system

Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process

HSU DUAN-FU STEPHEN

Method and apparatus for performing model-based OPC for pattern decomposed features

Method and apparatus for performing model-based OPC for pattern decomposed features

Method and apparatus for performing model-based OPC for pattern decomposed features

APPLIED MATERIALS INC

Optical projection array exposure system

Apparatus and methods for on-the-fly digital exposure image data modification

MICROUNITY SYSTEMS ENG

Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a mask

ASML HOLDING NV

Feature optimization using interference mapping lithography