Inventor
TROOST KARS ZEGER
NL30 patents
⚠️ This page may combine multiple inventors who share the name “TROOST KARS ZEGER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
20 patentsUS7177012B2Feb 13, 2007
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV30 citations92
US7116403B2Oct 3, 2006
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV30 citations92
US7500218B2Mar 3, 2009
Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same
ASML NETHERLANDS BV16 citations84
US7440078B2Oct 21, 2008
Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units
ASML NETHERLANDS BV13 citations84
US7548302B2Jun 16, 2009
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV12 citations82
US7362415B2Apr 22, 2008
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV15 citations80
US7209217B2Apr 24, 2007
Lithographic apparatus and device manufacturing method utilizing plural patterning devices
ASML NETHERLANDS BV8 citations74
US7403259B2Jul 22, 2008
Lithographic processing cell, lithographic apparatus, track and device manufacturing method
ASML NETHERLANDS BV7 citations72
US9958788B2May 1, 2018
Method of operating a patterning device and lithographic apparatus
ASML NETHERLANDS BV2 citations70
US7123348B2Oct 17, 2006
Lithographic apparatus and method utilizing dose control
ASML NETHERLANDS BV5 citations63
US7499146B2Mar 3, 2009
Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping
ASML NETHERLANDS BV4 citations62
US7679715B2Mar 16, 2010
Lithographic processing cell, lithographic apparatus, track and device manufacturing method
ASML NETHERLANDS BV4 citations61
US7728956B2Jun 1, 2010
Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data
ASML NETHERLANDS BV5 citations57
US9176392B2Nov 3, 2015
Lithographic apparatus and device manufacturing method using dose control
ASML NETHERLANDS BV0 citations52
US7466394B2Dec 16, 2008
Lithographic apparatus and device manufacturing method using a compensation scheme for a patterning array
ASML NETHERLANDS BV0 citations52
US7349068B2Mar 25, 2008
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV1 citations52
US7304718B2Dec 4, 2007
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV1 citations52
US7538855B2May 26, 2009
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations51
US11815808B2Nov 14, 2023
Method for high numerical aperture thru-slit source mask optimization
ASML NETHERLANDS BV0 citations49
US9568833B2Feb 14, 2017
Method of operating a patterning device and lithographic apparatus
ASML NETHERLANDS BV0 citations49
ASML HOLDING NV
5 patentsUS7400382B2Jul 15, 2008
Light patterning device using tilting mirrors in a superpixel form
ASML HOLDING NV24 citations92
US7411652B2Aug 12, 2008
Lithographic apparatus and device manufacturing method
ASML HOLDING NV13 citations84
US7859647B2Dec 28, 2010
Lithographic apparatus and device manufacturing method
ASML HOLDING NV7 citations71
US8009269B2Aug 30, 2011
Optimal rasterization for maskless lithography
ASML HOLDING NV2 citations56
US7713667B2May 11, 2010
System and method for generating pattern data used to control a pattern generator
ASML HOLDING NV1 citations52
TROOST KARS ZEGER
2 patentsUS8264667B2Sep 11, 2012
Lithographic apparatus and device manufacturing method using interferometric and other exposure
TROOST KARS ZEGER3 citations58
US8259285B2Sep 4, 2012
Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data
TROOST KARS ZEGER5 citations57