Inventor
FURUSHO TOSHINOBU
JP16 patents
⚠️ This page may combine multiple inventors who share the name “FURUSHO TOSHINOBU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
14 patentsUS6848625B2Feb 1, 2005
Process liquid supply mechanism and process liquid supply method
TOKYO ELECTRON LTD58 citations94
US9846363B2Dec 19, 2017
Processing liquid supplying apparatus and method of supplying processing liquid
TOKYO ELECTRON LTD7 citations83
US11342198B2May 24, 2022
Processing liquid supplying apparatus and processing liquid supplying method
TOKYO ELECTRON LTD3 citations72
US11099480B2Aug 24, 2021
Treatment solution supply apparatus and treatment solution supply method
TOKYO ELECTRON LTD3 citations72
US10074546B2Sep 11, 2018
Processing liquid supplying apparatus and processing liquid supplying method
TOKYO ELECTRON LTD2 citations72
US9731226B2Aug 15, 2017
Solution treatment apparatus and solution treatment method
TOKYO ELECTRON LTD3 citations72
US9732910B2Aug 15, 2017
Processing-liquid supply apparatus and processing-liquid supply method
TOKYO ELECTRON LTD3 citations72
US10734251B2Aug 4, 2020
Liquid processing apparatus, liquid processing method, and storage medium for liquid process
TOKYO ELECTRON LTD5 citations71
US9162163B2Oct 20, 2015
Processing liquid supply method, processing liquid supply apparatus and storage medium
TOKYO ELECTRON LTD4 citations71
US10268116B2Apr 23, 2019
Processing liquid supplying apparatus and method of supplying processing liquid
TOKYO ELECTRON LTD0 citations51
US10022652B2Jul 17, 2018
Solution treatment apparatus and solution treatment method
TOKYO ELECTRON LTD1 citations51
US9975073B2May 22, 2018
Processing liquid supply method, processing liquid supply apparatus and storage medium
TOKYO ELECTRON LTD1 citations51
US9878267B2Jan 30, 2018
Solution treatment apparatus and solution treatment method
TOKYO ELECTRON LTD1 citations51
US10035173B2Jul 31, 2018
Chemical supply system, substrate treatment apparatus incorporating the same, and coating and developing system incorporating the same apparatus
TOKYO ELECTRON LTD0 citations50
FURUSHO TOSHINOBU
2 patentsUS9372405B2Jun 21, 2016
Chemical liquid supply method and chemical liquid supply system
FURUSHO TOSHINOBU3 citations68
US9086190B2Jul 21, 2015
Chemical supply system, substrate treatment apparatus incorporating the same, and coating and developing system incorporating the same apparatus
FURUSHO TOSHINOBU2 citations58