Inventor
CAO YU
US336 patents
⚠️ This page may combine multiple inventors who share the name “CAO YU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
EMC CORP
11 patentsUS9031994B1May 12, 2015
Database partitioning for data processing system
EMC CORP55 citations98
US10448454B1Oct 15, 2019
Self-organizing distributed task coordination for ad-hoc computing environment
EMC CORP21 citations94
US10447546B1Oct 15, 2019
Customized visualizations for data centers
EMC CORP35 citations94
US10237149B1Mar 19, 2019
Application-level monitoring and profiling services in computing environments
EMC CORP24 citations94
US10091297B1Oct 2, 2018
Data processing and data movement in cloud computing environment
EMC CORP41 citations94
US9785645B1Oct 10, 2017
Database migration management
EMC CORP21 citations94
US9582328B1Feb 28, 2017
Allocation of resources in computing environments
EMC CORP22 citations94
US10534671B1Jan 14, 2020
Container image layer compaction
EMC CORP21 citations93
US10402733B1Sep 3, 2019
Adaptive ensemble workload prediction model based on machine learning algorithms
EMC CORP54 citations93
US10291706B1May 14, 2019
Container image distribution acceleration
EMC CORP27 citations93
US9923785B1Mar 20, 2018
Resource scaling in computing infrastructure
EMC CORP24 citations93
BRION TECH INC
7 patentsUS7120895B2Oct 10, 2006
System and method for lithography simulation
BRION TECH INC73 citations99
US7111277B2Sep 19, 2006
System and method for lithography simulation
BRION TECH INC65 citations99
US7003758B2Feb 21, 2006
System and method for lithography simulation
BRION TECH INC281 citations99
US7114145B2Sep 26, 2006
System and method for lithography simulation
BRION TECH INC63 citations98
US7488933B2Feb 10, 2009
Method for lithography model calibration
BRION TECH INC58 citations97
US7703069B1Apr 20, 2010
Three-dimensional mask model for photolithography simulation
BRION TECH INC128 citations96
US7117478B2Oct 3, 2006
System and method for lithography simulation
BRION TECH INC61 citations96
ASML NETHERLANDS BV
7 patentsUS9111062B2Aug 18, 2015
Fast freeform source and mask co-optimization method
ASML NETHERLANDS BV22 citations93
US8938694B2Jan 20, 2015
Three-dimensional mask model for photolithography simulation
ASML NETHERLANDS BV22 citations93
US8352885B2Jan 8, 2013
Three-dimensional mask model for photolithography simulation
ASML NETHERLANDS BV21 citations93
US7999920B2Aug 16, 2011
Method of performing model-based scanner tuning
ASML NETHERLANDS BV22 citations93
US7873937B2Jan 18, 2011
System and method for lithography simulation
ASML NETHERLANDS BV9 citations93
US7747978B2Jun 29, 2010
System and method for creating a focus-exposure model of a lithography process
ASML NETHERLANDS BV37 citations93
US9009647B2Apr 14, 2015
Methods and systems for lithography calibration using a mathematical model for a lithographic process
ASML NETHERLANDS BV16 citations92
PLATFORMATION INC
6 patentsUS8041611B2Oct 18, 2011
Pricing and auctioning of bundled items among multiple sellers and buyers
PLATFORMATION INC394 citations99
US7974972B2Jul 5, 2011
Methods and apparatus for searching with awareness of geography and languages
PLATFORMATION INC386 citations99
US7809610B2Oct 5, 2010
Methods and apparatus for freshness and completeness of information
PLATFORMATION INC352 citations99
US7571106B2Aug 4, 2009
Methods and apparatus for freshness and completeness of information
PLATFORMATION INC347 citations99
US7523108B2Apr 21, 2009
Methods and apparatus for searching with awareness of geography and languages
PLATFORMATION INC356 citations99
US7483894B2Jan 27, 2009
Methods and apparatus for entity search
PLATFORMATION INC401 citations99
YE JUN
5 patentsUS8200468B2Jun 12, 2012
Methods and system for lithography process window simulation
YE JUN147 citations99
US8570485B2Oct 29, 2013
Lens heating compensation systems and methods
YE JUN24 citations93
US8856694B2Oct 7, 2014
Computational process control
YE JUN20 citations92
US8542340B2Sep 24, 2013
Illumination optimization
YE JUN19 citations92
US8065636B2Nov 22, 2011
System and method for creating a focus-exposure model of a lithography process
YE JUN18 citations92
ONETTA INC
2 patentsFENG HANYING
2 patentsCHEN LUOQI
1 patentKLEINROCK LEONARD
1 patentKLA TENCOR TECH CORP
1 patentBRION TECNOLOGIES INC
1 patentHRL LAB LLC
1 patentBAIDU USA LLC
1 patentSEO JAE SUN
1 patentLIU PENG
1 patentBRUGUIER ANTOINE JEAN
1 patentYU SHIMENG
1 patentShowing the top 50 of 336 patents by PatentIndex Score.