Inventor
KIHARA YOSHIHIDE
JP70 patents
Patents
50 patentsUS11133192B2Sep 28, 2021
Workpiece processing method
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Etching method
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Method of processing target object
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Method for processing target object
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Method of processing target object
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Workpiece processing method
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US11615964B2Mar 28, 2023
Etching method
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US11551937B2Jan 10, 2023
Etching method
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US11450537B2Sep 20, 2022
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD2 citations72
US11244828B2Feb 8, 2022
Method for processing workpiece
TOKYO ELECTRON LTD2 citations71
US9859126B2Jan 2, 2018
Method for processing target object
TOKYO ELECTRON LTD3 citations71
US12532681B2Jan 20, 2026
Etching method and plasma processing system
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US12476115B2Nov 18, 2025
Method for processing workpiece
TOKYO ELECTRON LTD0 citations62
US12412749B2Sep 9, 2025
Etching method and plasma processing system
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Plasma processing method and plasma processing system
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Substrate processing method and substrate processing system
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US12198938B2Jan 14, 2025
Etching method
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Etching method
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Plasma processing method and plasma processing apparatus
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Substrate processing method and substrate processing system
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Apparatus for processing substrate
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US11600501B2Mar 7, 2023
Etching method and plasma processing apparatus
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US11495469B2Nov 8, 2022
Method for processing substrates
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Plasma processing method and plasma processing apparatus
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Method of processing target object
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US11367610B2Jun 21, 2022
Film forming and process container cleaning method
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US11139175B2Oct 5, 2021
Method of processing target object
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US11114304B2Sep 7, 2021
Substrate processing method
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US11081360B2Aug 3, 2021
Method for processing workpiece
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US10886136B2Jan 5, 2021
Method for processing substrates
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Etching method
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US10233535B2Mar 19, 2019
Plasma processing apparatus and plasma processing method
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US7326650B2Feb 5, 2008
Method of etching dual damascene structure
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Etching method and plasma processing apparatus
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Substrate processing method and substrate processing apparatus
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US11961746B2Apr 16, 2024
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US11823903B2Nov 21, 2023
Method for processing workpiece
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US11728166B2Aug 15, 2023
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US11637003B2Apr 25, 2023
Method for etching film and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US11557485B2Jan 17, 2023
Plasma processing method and plasma processing apparatus
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US11417535B2Aug 16, 2022
Etching method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US11094551B2Aug 17, 2021
Plasma processing method and plasma processing apparatus
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US11056370B2Jul 6, 2021
Method for processing workpiece
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US10460963B2Oct 29, 2019
Plasma processing method
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Substrate processing method and substrate processing apparatus
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Method for etching for semiconductor fabrication
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Plasma processing method and plasma processing system
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In-situ adsorbate formation for plasma etch process
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US11798793B2Oct 24, 2023
Substrate processing method, component processing method, and substrate processing apparatus
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US11495468B2Nov 8, 2022
Etching method and etching apparatus
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Showing the top 50 of 70 patents by PatentIndex Score.