Inventor
ISOBE ASAO
JP16 patents
⚠️ This page may combine multiple inventors who share the name “ISOBE ASAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI CHEMICAL CO LTD
13 patentsUS4698291AOct 6, 1987
Photosensitive composition with 4-azido-2'-methoxychalcone
HITACHI CHEMICAL CO LTD61 citations95
US3989610ANov 2, 1976
Photosensitive epoxy-acrylate resin compositions
HITACHI CHEMICAL CO LTD64 citations95
US4499163AFeb 12, 1985
Soldering mask formed from a photosensitive resin composition and a photosensitive element
HITACHI CHEMICAL CO LTD48 citations92
US4025348AMay 24, 1977
Photosensitive resin compositions
HITACHI CHEMICAL CO LTD41 citations92
US4295947AOct 20, 1981
Photo-curable coating compositions for building materials
HITACHI CHEMICAL CO LTD19 citations80
US5314783AMay 24, 1994
Photosensitive quinone diazide and resin composition having high absorbency for a wavelength of 365 nm containing a benzotriazole ultraviolet absorbing compound
HITACHI CHEMICAL CO LTD8 citations73
US4108666AAug 22, 1978
Monofunctional monomer-containing photosensitive composition for photoresist
HITACHI CHEMICAL CO LTD11 citations73
US4035189AJul 12, 1977
Image forming curable resin compositions
HITACHI CHEMICAL CO LTD19 citations73
US4154709AMay 15, 1979
Water-dispersible epoxy modified alkyd resins
HITACHI CHEMICAL CO LTD9 citations71
US4101364AJul 18, 1978
Method of an apparatus for producing film-laminated base plates
HITACHI CHEMICAL CO LTD15 citations71
US4513077AApr 23, 1985
Electron beam or X-ray reactive image-formable resinous composition
HITACHI CHEMICAL CO LTD5 citations63
US5215858AJun 1, 1993
Photosensitive resin composition and pattern formation using the same
HITACHI CHEMICAL CO LTD2 citations62
US4801519AJan 31, 1989
Process for producing a pattern with negative-type photosensitive composition
HITACHI CHEMICAL CO LTD6 citations62
HITACHI LTD
3 patentsUS5441849AAug 15, 1995
Method of forming pattern and making semiconductor device using radiation-induced conductive resin bottom resist layer
HITACHI LTD30 citations91
US4554237ANov 19, 1985
Photosensitive resin composition and method for forming fine patterns with said composition
HITACHI LTD22 citations82
US4722883AFeb 2, 1988
Process for producing fine patterns
HITACHI LTD13 citations73