Inventor
MITSUHASHI KOUJI
JP29 patents
⚠️ This page may combine multiple inventors who share the name “MITSUHASHI KOUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
20 patentsUS7780786B2Aug 24, 2010
Internal member of a plasma processing vessel
TOKYO ELECTRON LTD51 citations98
US6837966B2Jan 4, 2005
Method and apparatus for an improved baffle plate in a plasma processing system
TOKYO ELECTRON LTD84 citations98
US7166200B2Jan 23, 2007
Method and apparatus for an improved upper electrode plate in a plasma processing system
TOKYO ELECTRON LTD49 citations96
US7163585B2Jan 16, 2007
Method and apparatus for an improved optical window deposition shield in a plasma processing system
TOKYO ELECTRON LTD56 citations96
US6798519B2Sep 28, 2004
Method and apparatus for an improved optical window deposition shield in a plasma processing system
TOKYO ELECTRON LTD44 citations96
US6899786B2May 31, 2005
Processing device and method of maintaining the device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanism
TOKYO ELECTRON LTD52 citations95
US7811428B2Oct 12, 2010
Method and apparatus for an improved optical window deposition shield in a plasma processing system
TOKYO ELECTRON LTD14 citations92
US7282112B2Oct 16, 2007
Method and apparatus for an improved baffle plate in a plasma processing system
TOKYO ELECTRON LTD18 citations92
US7204912B2Apr 17, 2007
Method and apparatus for an improved bellows shield in a plasma processing system
TOKYO ELECTRON LTD23 citations92
US7166166B2Jan 23, 2007
Method and apparatus for an improved baffle plate in a plasma processing system
TOKYO ELECTRON LTD40 citations92
US7147749B2Dec 12, 2006
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
TOKYO ELECTRON LTD42 citations92
US7137353B2Nov 21, 2006
Method and apparatus for an improved deposition shield in a plasma processing system
TOKYO ELECTRON LTD32 citations92
US6790289B2Sep 14, 2004
Method of cleaning a plasma processing apparatus
TOKYO ELECTRON LTD22 citations92
US8877002B2Nov 4, 2014
Internal member of a plasma processing vessel
TOKYO ELECTRON LTD7 citations84
US7678226B2Mar 16, 2010
Method and apparatus for an improved bellows shield in a plasma processing system
TOKYO ELECTRON LTD15 citations84
US7566368B2Jul 28, 2009
Method and apparatus for an improved upper electrode plate in a plasma processing system
TOKYO ELECTRON LTD13 citations84
US7481903B2Jan 27, 2009
Processing device and method of maintaining the device, mechanism and method for assembling processing device parts, and lock mechanism and method for locking the lock mechanism
TOKYO ELECTRON LTD11 citations83
US7566379B2Jul 28, 2009
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
TOKYO ELECTRON LTD5 citations63
US7942975B2May 17, 2011
Ceramic sprayed member-cleaning method
TOKYO ELECTRON LTD1 citations52
US7892361B2Feb 22, 2011
In-chamber member, a cleaning method therefor and a plasma processing apparatus
TOKYO ELECTRON LTD0 citations52