Inventor
KATO JURI
JP36 patents
⚠️ This page may combine multiple inventors who share the name “KATO JURI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEIKO EPSON CORP
31 patentsUS7906813B2Mar 15, 2011
Semiconductor device having a first circuit block isolating a plurality of circuit blocks
SEIKO EPSON CORP110 citations98
US5641983AJun 24, 1997
Semiconductor device having a gate electrode having a low dopant concentration
SEIKO EPSON CORP33 citations92
US5229334AJul 20, 1993
Method of forming a gate insulating film involving a step of cleaning using an ammonia-peroxide solution
SEIKO EPSON CORP37 citations92
US5312772AMay 17, 1994
Method of manufacturing interconnect metallization comprising metal nitride and silicide
SEIKO EPSON CORP35 citations90
US4998157AMar 5, 1991
Ohmic contact to silicon substrate
SEIKO EPSON CORP23 citations90
US7830215B2Nov 9, 2010
Piezoelectric oscillator and method for manufacturing the same
SEIKO EPSON CORP12 citations84
US5654209AAug 5, 1997
Method of making N-type semiconductor region by implantation
SEIKO EPSON CORP19 citations84
US5298860AMar 29, 1994
Method of analyzing metal impurities in surface oxide film of semiconductor substrate
SEIKO EPSON CORP15 citations74
US4669176AJun 2, 1987
Method for diffusing a semiconductor substrate through a metal silicide layer by rapid heating
SEIKO EPSON CORP17 citations74
US10393688B2Aug 27, 2019
Sensor device
SEIKO EPSON CORP3 citations72
US7863669B2Jan 4, 2011
Nonvolatile semiconductor memory device
SEIKO EPSON CORP2 citations63
US7638845B2Dec 29, 2009
Semiconductor device with buried conductive layer
SEIKO EPSON CORP4 citations63
US7563665B2Jul 21, 2009
Semiconductor device and method for manufacturing semiconductor device
SEIKO EPSON CORP4 citations63
US7368340B2May 6, 2008
Semiconductor device and method of making semiconductor devices
SEIKO EPSON CORP2 citations63
US7351616B2Apr 1, 2008
Semiconductor substrate, semiconductor device, method for manufacturing semiconductor substrate and method for manufacturing semiconductor device
SEIKO EPSON CORP3 citations63
US7344997B2Mar 18, 2008
Semiconductor substrate, semiconductor device, method for manufacturing semiconductor substrate and method for manufacturing semiconductor device
SEIKO EPSON CORP2 citations63
US7332399B2Feb 19, 2008
Method for manufacturing a semiconductor substrate and method for manufacturing a semiconductor in which film thicknesses can be accurately controlled
SEIKO EPSON CORP6 citations63
US7227264B2Jun 5, 2007
Semiconductor device and method for manufacturing semiconductor device
SEIKO EPSON CORP5 citations63
US6156592ADec 5, 2000
Method of manufacturing a semiconductor device containing CMOS elements
SEIKO EPSON CORP3 citations63
US5879979AMar 9, 1999
Method of manufacturing a semiconductor device containing CMOS elements
SEIKO EPSON CORP2 citations63
US4800417AJan 24, 1989
Improved semiconductor device having a polycrystalline isolation region
SEIKO EPSON CORP4 citations63
US9297741B2Mar 29, 2016
Corrosion detection sensor device
SEIKO EPSON CORP2 citations62
US7666795B2Feb 23, 2010
Method for manufacturing semiconductor device
SEIKO EPSON CORP5 citations62
US7271447B2Sep 18, 2007
Semiconductor device
SEIKO EPSON CORP5 citations62
US7956414B2Jun 7, 2011
Semiconductor substrate, semiconductor device, method for manufacturing semiconductor substrate, and method for manufacturing semiconductor device
SEIKO EPSON CORP0 citations52
US7687866B2Mar 30, 2010
Semiconductor device and method of manufacturing semiconductor device
SEIKO EPSON CORP0 citations52
US7622359B2Nov 24, 2009
Method for manufacturing semiconductor device
SEIKO EPSON CORP0 citations52
US7491609B2Feb 17, 2009
Semiconductor device and method for manufacturing the same
SEIKO EPSON CORP1 citations52
US7425484B2Sep 16, 2008
Method of manufacturing semiconductor device
SEIKO EPSON CORP1 citations52
US7898016B2Mar 1, 2011
CMOS semiconductor non-volatile memory device
SEIKO EPSON CORP0 citations42
US8017505B2Sep 13, 2011
Method for manufacturing a semiconductor device
SEIKO EPSON CORP0 citations33