Inventor

IKEDA MASAYOSHI

JP28 patents

⚠️ This page may combine multiple inventors who share the name “IKEDA MASAYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IKEDA MASAYOSHI

CANON ANELVA CORP

Electrostatic chucking stage and substrate processing apparatus

Electrostatic chucking stage and substrate processing apparatus

Substrate processing method and method of manufacturing semiconductor device

Method of manufacturing magnetoresistive element and method of processing magnetoresistive film

Substrate processing apparatus

Method of fabricating fin FET and method of fabricating device

Electrostatic chucking stage and substrate processing apparatus

Semiconductor device manufacturing method

Method of manufacturing magnetoresistive element

High-frequency plasma processing apparatus

High-frequency plasma processing apparatus

Surface processing apparatus

SHOWA CORP

Vehicle height adjustment device

Vehicle height adjustment device

Vehicle height adjustment device

Vehicle height adjustment device

ANELVA CORP

Method of substrate temperature control and method of assessing substrate temperature controllability

RF plasma processing method and RF plasma processing system

Brine supply unit

IKEDA MASAYOSHI

Plasma treatment apparatus

Plasma processing apparatus

HITACHI CHEMICAL CO LTD

Surface roughening of ceramics and application to production of ceramic wiring board

Process for forming metallic film on inorganic material

EBARA CORP

Silencer for attenuating a sound or noise transmitted through an air passage of a duct

TOTO LTD

Electrostatic chuck module and cooling system

IORI KAZUYUKI

Magnetic field generating apparatus and plasma processing apparatus

NEC CORP

Method and apparatus for manufacturing semiconductor device

TOYOSATO TOMOHIKO

Method for manufacturing magnetoresistance effect element