Inventor
MITSUI MASARU
JP24 patents
⚠️ This page may combine multiple inventors who share the name “MITSUI MASARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOYA CORP
21 patentsUS6037083AMar 14, 2000
Halftone phase shift mask blanks, halftone phase shift masks, and fine pattern forming method
HOYA CORP81 citations96
US5942356AAug 24, 1999
Phase shift mask and phase shift mask blank
HOYA CORP56 citations94
US5635315AJun 3, 1997
Phase shift mask and phase shift mask blank
HOYA CORP31 citations92
USD568839SMay 13, 2008
Photomask blank
HOYA CORP9 citations82
USD543160SMay 22, 2007
Photomask blank
HOYA CORP13 citations82
US5804337ASep 8, 1998
Phase shift mask and phase shift mask blank
HOYA CORP16 citations82
US6723477B2Apr 20, 2004
Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask
HOYA CORP6 citations74
US6242138B1Jun 5, 2001
Phase shift mask and phase shift mask blank
HOYA CORP8 citations72
US6153341ANov 28, 2000
Phase shift mask and phase shift mask blank
HOYA CORP11 citations72
US6762000B2Jul 13, 2004
Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks
HOYA CORP10 citations70
US7833387B2Nov 16, 2010
Mask blank manufacturing method and sputtering target for manufacturing the same
HOYA CORP6 citations63
US8039178B2Oct 18, 2011
Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks
HOYA CORP4 citations62
USD537048SFeb 20, 2007
Photomask blank
HOYA CORP5 citations62
US5858582AJan 12, 1999
Phase shift mask and phase shift mask blank
HOYA CORP3 citations62
US5849439ADec 15, 1998
Method for preparing phase shift mask blank, and phase mask
HOYA CORP5 citations62
US6475681B2Nov 5, 2002
Phase shift mask and phase shift mask blank
HOYA CORP3 citations61
US7217481B2May 15, 2007
Photomask blank, photomask, methods of manufacturing the same and methods of forming micropattern
HOYA CORP2 citations59
US7862960B2Jan 4, 2011
Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks
HOYA CORP0 citations52
US7601468B2Oct 13, 2009
Process for manufacturing half-tone phase shifting mask blanks
HOYA CORP0 citations51
US7141339B2Nov 28, 2006
Process for manufacturing half-tone phase shifting mask blanks
HOYA CORP1 citations51
US7026077B2Apr 11, 2006
Photomask blank manufacturing method
HOYA CORP1 citations51