Inventor
NAKAYAMA MUNEO
JP28 patents
⚠️ This page may combine multiple inventors who share the name “NAKAYAMA MUNEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
17 patentsUS4385086AMay 24, 1983
Method for preventing leaching of contaminants from solid surfaces
TOKYO OHKA KOGYO CO LTD75 citations96
US4865649ASep 12, 1989
Coating solution for forming a silica-based coating film
TOKYO OHKA KOGYO CO LTD54 citations95
US4277525AJul 7, 1981
Liquid compositions for forming silica coating films
TOKYO OHKA KOGYO CO LTD61 citations95
US5156884AOct 20, 1992
Method for forming a film of oxidized metal
TOKYO OHKA KOGYO CO LTD24 citations92
US4960618AOct 2, 1990
Process for formation of metal oxide film
TOKYO OHKA KOGYO CO LTD29 citations92
US4908065AMar 13, 1990
Coating solution for use in the formation of metal oxide film
TOKYO OHKA KOGYO CO LTD42 citations92
US4900582AFeb 13, 1990
Method for improving film quality of silica-based films
TOKYO OHKA KOGYO CO LTD34 citations92
US4894254AJan 16, 1990
Method of forming silicone film
TOKYO OHKA KOGYO CO LTD30 citations92
US5238713AAug 24, 1993
Spin-on method and apparatus for applying coating material to a substrate, including an air flow developing and guiding step/means
TOKYO OHKA KOGYO CO LTD29 citations91
US5116250AMay 26, 1992
Method and apparatus for applying a coating material to a substrate
TOKYO OHKA KOGYO CO LTD24 citations91
US4941426AJul 17, 1990
Thin-film coating apparatus
TOKYO OHKA KOGYO CO LTD23 citations91
US4793862ADec 27, 1988
Silica-based antimony containing film-forming composition
TOKYO OHKA KOGYO CO LTD20 citations82
US4749436AJun 7, 1988
Equipment for thermal stabilization process of photoresist pattern on semiconductor wafer
TOKYO OHKA KOGYO CO LTD23 citations82
US5261566ANov 16, 1993
Solution-dropping nozzle device
TOKYO OHKA KOGYO CO LTD10 citations74
US4868096ASep 19, 1989
Surface treatment of silicone-based coating films
TOKYO OHKA KOGYO CO LTD16 citations73
US4867345ASep 19, 1989
Thin-film coating apparatus
TOKYO OHKA KOGYO CO LTD3 citations63
US4835017AMay 30, 1989
Liquid composition for forming silica-based coating film
TOKYO OHKA KOGYO CO LTD5 citations63
TOKYO DENSHI KAGAKU KK
6 patentsUS4790262ADec 13, 1988
Thin-film coating apparatus
TOKYO DENSHI KAGAKU KK106 citations95
US4474642AOct 2, 1984
Method for pattern-wise etching of a metallic coating film
TOKYO DENSHI KAGAKU KK33 citations92
US4268539AMay 19, 1981
Liquid coating composition for forming transparent conductive films and a coating process for using said composition
TOKYO DENSHI KAGAKU KK27 citations79
US4597882AJul 1, 1986
Process for regenerating waste oils of synthetic lubricants containing fluorine atom
TOKYO DENSHI KAGAKU KK12 citations74
USD291413SAug 18, 1987
Wafer holding frame
TOKYO DENSHI KAGAKU KK11 citations73
US4542710ASep 24, 1985
Solution-dropping nozzle device
TOKYO DENSHI KAGAKU KK5 citations62
TOKYO DENSHI KAGAKU KABUSHIKI
4 patentsUS4694040ASep 15, 1987
Liquid composition for forming a coating film of organopolysiloxane and method for the preparation thereof
TOKYO DENSHI KAGAKU KABUSHIKI52 citations95
US4550239AOct 29, 1985
Automatic plasma processing device and heat treatment device
TOKYO DENSHI KAGAKU KABUSHIKI57 citations95
US4550242AOct 29, 1985
Automatic plasma processing device and heat treatment device for batch treatment of workpieces
TOKYO DENSHI KAGAKU KABUSHIKI36 citations92
US4528934AJul 16, 1985
Thin-film coating apparatus
TOKYO DENSHI KAGAKU KABUSHIKI10 citations73