Inventor
JUNG SOONWOOK
KR15 patents
⚠️ This page may combine multiple inventors who share the name “JUNG SOONWOOK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
12 patentsUS10504754B2Dec 10, 2019
Systems and methods for improved semiconductor etching and component protection
APPLIED MATERIALS INC16 citations92
US10593560B2Mar 17, 2020
Magnetic induction plasma source for semiconductor processes and equipment
APPLIED MATERIALS INC3 citations73
US10541184B2Jan 21, 2020
Optical emission spectroscopic techniques for monitoring etching
APPLIED MATERIALS INC3 citations73
US9874524B2Jan 23, 2018
In-situ spatially resolved plasma monitoring by using optical emission spectroscopy
APPLIED MATERIALS INC2 citations73
US10522371B2Dec 31, 2019
Systems and methods for improved semiconductor etching and component protection
APPLIED MATERIALS INC2 citations71
US11894217B2Feb 6, 2024
Plasma ignition optimization in semiconductor processing chambers
APPLIED MATERIALS INC0 citations62
US11587765B2Feb 21, 2023
Plasma ignition optimization in semiconductor processing chambers
APPLIED MATERIALS INC1 citations62
US11735441B2Aug 22, 2023
Systems and methods for improved semiconductor etching and component protection
APPLIED MATERIALS INC0 citations61
US12575360B2Mar 10, 2026
Semiconductor processing chamber adapter
APPLIED MATERIALS INC0 citations51
US12340979B2Jun 24, 2025
Semiconductor processing chamber for improved precursor flow
APPLIED MATERIALS INC0 citations50
US12476094B2Nov 18, 2025
Model-based characterization of plasmas in semiconductor processing systems
APPLIED MATERIALS INC0 citations44
US9922840B2Mar 20, 2018
Adjustable remote dissociation
APPLIED MATERIALS INC0 citations41
SAMSUNG ELECTRONICS CO LTD
3 patentsUS9293336B2Mar 22, 2016
Semiconductor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD7 citations78
US12310055B2May 20, 2025
Semiconductor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US10607832B2Mar 31, 2020
Method and apparatus for forming a thin layer
SAMSUNG ELECTRONICS CO LTD0 citations35