Inventor
ZWIER OLGER VICTOR
NL10 patents
Patents
10 patentsUS10606178B2Mar 31, 2020
Method of measuring a target, and metrology apparatus
ASML NETHERLANDS BV10 citations81
US11385553B2Jul 12, 2022
Metrology method, patterning device, apparatus and computer program
ASML NETHERLANDS BV2 citations72
US10996570B2May 4, 2021
Metrology method, patterning device, apparatus and computer program
ASML NETHERLANDS BV2 citations72
US12276921B2Apr 15, 2025
Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method
ASML NETHERLANDS BV2 citations71
US12242203B2Mar 4, 2025
Target for measuring a parameter of a lithographic process
ASML NETHERLANDS BV0 citations62
US12013647B2Jun 18, 2024
Metrology method
ASML NETHERLANDS BV0 citations59
US11448974B2Sep 20, 2022
Metrology parameter determination and metrology recipe selection
ASML NETHERLANDS BV0 citations57
US10990020B2Apr 27, 2021
Metrology parameter determination and metrology recipe selection
ASML NETHERLANDS BV0 citations57
US12019377B2Jun 25, 2024
Target for measuring a parameter of a lithographic process
ASML NETHERLANDS BV0 citations51
US11982946B2May 14, 2024
Metrology targets
ASML NETHERLANDS BV0 citations50