P

Inventor

UEHARA AKIRA

JP35 patents
⚠️ This page may combine multiple inventors who share the name “UEHARA AKIRA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

21 patents
US5584647ADec 17, 1996

Object handling devices

TOKYO OHKA KOGYO CO LTD146 citations98
US5083896AJan 28, 1992

Object handling device

TOKYO OHKA KOGYO CO LTD76 citations96
US4318767AMar 9, 1982

Apparatus for the treatment of semiconductor wafers by plasma reaction

TOKYO OHKA KOGYO CO LTD112 citations96
US4208159AJun 17, 1980

Apparatus for the treatment of a wafer by plasma reaction

TOKYO OHKA KOGYO CO LTD70 citations96
US4483651ANov 20, 1984

Automatic apparatus for continuous treatment of leaf materials with gas plasma

TOKYO OHKA KOGYO CO LTD58 citations95
US4245154AJan 13, 1981

Apparatus for treatment with gas plasma

TOKYO OHKA KOGYO CO LTD93 citations95
US5022979AJun 11, 1991

Electrode for use in the treatment of an object in a plasma

TOKYO OHKA KOGYO CO LTD58 citations94
US5006220AApr 9, 1991

Electrode for use in the treatment of an object in a plasma

TOKYO OHKA KOGYO CO LTD89 citations94
US5364488ANov 15, 1994

Coaxial plasma processing apparatus

TOKYO OHKA KOGYO CO LTD47 citations92
US4894254AJan 16, 1990

Method of forming silicone film

TOKYO OHKA KOGYO CO LTD30 citations92
US4336438AJun 22, 1982

Apparatus for automatic semi-batch sheet treatment of semiconductor wafers by plasma reaction

TOKYO OHKA KOGYO CO LTD46 citations91
US4749436AJun 7, 1988

Equipment for thermal stabilization process of photoresist pattern on semiconductor wafer

TOKYO OHKA KOGYO CO LTD23 citations82
US4578559AMar 25, 1986

Plasma etching method

TOKYO OHKA KOGYO CO LTD23 citations82
US4149923AApr 17, 1979

Apparatus for the treatment of wafer materials by plasma reaction

TOKYO OHKA KOGYO CO LTD28 citations82
US4946537AAug 7, 1990

Plasma reactor

TOKYO OHKA KOGYO CO LTD9 citations74
US6436472B1Aug 20, 2002

Method of applying a coating solution to a substrate surface using a rotary coater

TOKYO OHKA KOGYO CO LTD10 citations73
US6067930AMay 30, 2000

Coaxial plasma processing apparatus

TOKYO OHKA KOGYO CO LTD13 citations73
US4868096ASep 19, 1989

Surface treatment of silicone-based coating films

TOKYO OHKA KOGYO CO LTD16 citations73
US5709519AJan 20, 1998

Plasma processing apparatus

TOKYO OHKA KOGYO CO LTD9 citations72
US5344536ASep 6, 1994

Method of and apparatus for processing a workpiece in plasma

TOKYO OHKA KOGYO CO LTD18 citations71
US6761930B2Jul 13, 2004

Method of coating solution on substrate surface using a slit nozzle

TOKYO OHKA KOGYO CO LTD1 citations51

UEHARA AKIRA

5 patents

TOKYO DENSHI KAGAKU KK

4 patents

TOKYO DENSHI KAGAKU KABUSHIKI

2 patents

YOKOGAWA ELECTRIC CORP

2 patents

TOKAI RUBBER IND LTD

1 patent