Inventor
HIJIKATA ISAMU
JP17 patents
⚠️ This page may combine multiple inventors who share the name “HIJIKATA ISAMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
13 patentsUS5584647ADec 17, 1996
Object handling devices
TOKYO OHKA KOGYO CO LTD146 citations98
US5083896AJan 28, 1992
Object handling device
TOKYO OHKA KOGYO CO LTD76 citations96
US4318767AMar 9, 1982
Apparatus for the treatment of semiconductor wafers by plasma reaction
TOKYO OHKA KOGYO CO LTD112 citations96
US4483651ANov 20, 1984
Automatic apparatus for continuous treatment of leaf materials with gas plasma
TOKYO OHKA KOGYO CO LTD58 citations95
US5022979AJun 11, 1991
Electrode for use in the treatment of an object in a plasma
TOKYO OHKA KOGYO CO LTD58 citations94
US5006220AApr 9, 1991
Electrode for use in the treatment of an object in a plasma
TOKYO OHKA KOGYO CO LTD89 citations94
US4900582AFeb 13, 1990
Method for improving film quality of silica-based films
TOKYO OHKA KOGYO CO LTD34 citations92
US4894254AJan 16, 1990
Method of forming silicone film
TOKYO OHKA KOGYO CO LTD30 citations92
US4749436AJun 7, 1988
Equipment for thermal stabilization process of photoresist pattern on semiconductor wafer
TOKYO OHKA KOGYO CO LTD23 citations82
US4578559AMar 25, 1986
Plasma etching method
TOKYO OHKA KOGYO CO LTD23 citations82
US4946537AAug 7, 1990
Plasma reactor
TOKYO OHKA KOGYO CO LTD9 citations74
US4868096ASep 19, 1989
Surface treatment of silicone-based coating films
TOKYO OHKA KOGYO CO LTD16 citations73
US5254214AOct 19, 1993
Plasma taper etching for semiconductor device fabrication
TOKYO OHKA KOGYO CO LTD6 citations63