Inventor
PETRILLO KAREN E
US20 patents
⚠️ This page may combine multiple inventors who share the name “PETRILLO KAREN E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
17 patentsUS6043003AMar 28, 2000
E-beam application to mask making using new improved KRS resist system
IBM45 citations96
US6037097AMar 14, 2000
E-beam application to mask making using new improved KRS resist system
IBM50 citations96
US7361444B1Apr 22, 2008
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
IBM22 citations92
US6436605B1Aug 20, 2002
Plasma resistant composition and use thereof
IBM31 citations92
US5593812AJan 14, 1997
Photoresist having increased sensitivity and use thereof
IBM18 citations92
US6251569B1Jun 26, 2001
Forming a pattern of a negative photoresist
IBM23 citations91
US7709177B2May 4, 2010
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
IBM7 citations73
US6617086B2Sep 9, 2003
Forming a pattern of a negative photoresist
IBM5 citations72
US10254652B2Apr 9, 2019
Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning
IBM3 citations71
US10082736B2Sep 25, 2018
Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning
IBM3 citations71
US11022891B2Jun 1, 2021
Photoresist bridging defect removal by reverse tone weak developer
IBM0 citations62
US11022890B2Jun 1, 2021
Photoresist bridging defect removal by reverse tone weak developer
IBM0 citations62
US7736833B2Jun 15, 2010
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
IBM3 citations62
US6586156B2Jul 1, 2003
Etch improved resist systems containing acrylate (or methacrylate) silane monomers
IBM6 citations61
US7314700B2Jan 1, 2008
High sensitivity resist compositions for electron-based lithography
IBM1 citations51
US12087601B2Sep 10, 2024
Reducing line edge roughness and mitigating defects by wafer freezing
IBM0 citations48
US7960095B2Jun 14, 2011
Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates
IBM0 citations42