Inventor
SATOH HIDETOSHI
JP19 patents
⚠️ This page may combine multiple inventors who share the name “SATOH HIDETOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
16 patentsUS6159644ADec 12, 2000
Method of fabricating semiconductor circuit devices utilizing multiple exposures
HITACHI LTD100 citations98
US6121625ASep 19, 2000
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD30 citations96
US6653052B2Nov 25, 2003
Electron device manufacturing method, a pattern forming method, and a photomask used for those methods
HITACHI LTD15 citations92
US5650631AJul 22, 1997
Electron beam writing system
HITACHI LTD22 citations92
US5396077AMar 7, 1995
Electron beam lithography apparatus having electron optics correction system
HITACHI LTD24 citations92
US5520297AMay 28, 1996
Aperture plate and a method of manufacturing the same
HITACHI LTD19 citations85
US6703171B2Mar 9, 2004
Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method
HITACHI LTD13 citations84
US6573520B1Jun 3, 2003
Electron beam lithography system
HITACHI LTD14 citations84
US6759666B2Jul 6, 2004
Method and apparatus for charged particle beam exposure
HITACHI LTD8 citations74
US6441383B1Aug 27, 2002
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD6 citations74
US6320198B1Nov 20, 2001
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD4 citations74
US6262428B1Jul 17, 2001
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD6 citations74
US6555833B2Apr 29, 2003
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD1 citations63
US6583431B2Jun 24, 2003
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD0 citations52
US6509572B2Jan 21, 2003
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD0 citations52
US6329665B1Dec 11, 2001
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD0 citations52
RENESAS TECH CORP
2 patentsUS6927002B2Aug 9, 2005
Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method
RENESAS TECH CORP17 citations92
US6750000B2Jun 15, 2004
Electron device manufacturing method, a pattern forming method, and a photomask used for those methods
RENESAS TECH CORP10 citations74