Inventor
VENEMA WILLEM JURRIANUS
NL20 patents
⚠️ This page may combine multiple inventors who share the name “VENEMA WILLEM JURRIANUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
16 patentsUS7250237B2Jul 31, 2007
Optimized correction of wafer thermal deformations in a lithographic process
ASML NETHERLANDS BV19 citations90
US7230677B2Jun 12, 2007
Lithographic apparatus and device manufacturing method utilizing hexagonal image grids
ASML NETHERLANDS BV10 citations83
US7221514B2May 22, 2007
Variable lens and exposure system
ASML NETHERLANDS BV13 citations83
US7830493B2Nov 9, 2010
System and method for compensating for radiation induced thermal distortions in a substrate or projection system
ASML NETHERLANDS BV10 citations79
US7477772B2Jan 13, 2009
Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compression
ASML NETHERLANDS BV8 citations79
US7233384B2Jun 19, 2007
Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor
ASML NETHERLANDS BV10 citations79
US7595496B2Sep 29, 2009
Optimized correction of wafer thermal deformations in a lithographic process
ASML NETHERLANDS BV7 citations72
US9958788B2May 1, 2018
Method of operating a patterning device and lithographic apparatus
ASML NETHERLANDS BV2 citations70
US7528933B2May 5, 2009
Lithographic apparatus and device manufacturing method utilizing a MEMS mirror with large deflection using a non-linear spring arrangement
ASML NETHERLANDS BV2 citations62
US7391503B2Jun 24, 2008
System and method for compensating for thermal expansion of lithography apparatus or substrate
ASML NETHERLANDS BV2 citations62
US7391676B2Jun 24, 2008
Ultrasonic distance sensors
ASML NETHERLANDS BV3 citations61
US7209216B2Apr 24, 2007
Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithography
ASML NETHERLANDS BV4 citations58
US7671319B2Mar 2, 2010
Lithographic apparatus, device manufacturing method and energy sensor
ASML NETHERLANDS BV0 citations51
US7307694B2Dec 11, 2007
Lithographic apparatus, radiation beam inspection device, method of inspecting a beam of radiation and device manufacturing method
ASML NETHERLANDS BV1 citations51
US9568833B2Feb 14, 2017
Method of operating a patterning device and lithographic apparatus
ASML NETHERLANDS BV0 citations49
US9658541B2May 23, 2017
Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate
ASML NETHERLANDS BV0 citations48