Inventor

VENUGOPAL VIJAYAKUMAR C

US20 patents

⚠️ This page may combine multiple inventors who share the name “VENUGOPAL VIJAYAKUMAR C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VENUGOPAL VIJAYAKUMAR C

LAM RES CORP

Process endpoint detection method using broadband reflectometry

Method for in-situ monitoring of patterned substrate processing using reflectometry.

Methods and apparatus for normalizing optical emission spectra

Process endpoint detection method using broadband reflectometry

Apparatus and method for controlling etch depth

Method for controlling a recess etch process

Collimator arrangements including multiple collimators and implementation methods thereof

APPLIED MATERIALS INC

Methods and apparatuses for plasma chamber matching and fault identification

Processing chamber hardware fault detection using spectral radio frequency analysis

Processing chamber hardware fault detection using spectral radio frequency analysis

VENUGOPAL VIJAYAKUMAR C

Methods and arrangements for in-situ process monitoring and control for plasma processing tools

Methods and apparatus for normalizing optical emission spectra

ALBAREDE LUC

Methods and apparatus for predictive preventive maintenance of processing chambers

Arrangement for identifying uncontrolled events at the process module level and methods thereof

YUN GUNSU

Automatic fault detection and classification in a plasma processing system and methods thereof

HUANG CHUNG HO

Arrangement for identifying uncontrolled events at the process module level and methods thereof

CHOI BRIAN

Determining plasma processing system readiness without generating plasma

WANG JIANGXIN

Methods for constructing an optimal endpoint algorithm

CHOI BRIAN D

Methods and apparatus to predict etch rate uniformity for qualification of a plasma chamber

VARIAN SEMICONDUCTOR EQUIPMENT ASS INC

Apparatus and method for efficient materials use during substrate processing