P

Inventor

BACH FLORIAN

DE17 patents
⚠️ This page may combine multiple inventors who share the name “BACH FLORIAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ZEISS CARL SMT GMBH

9 patents
US9996012B2Jun 12, 2018

Facet mirror for use in a projection exposure apparatus for microlithography

ZEISS CARL SMT GMBH2 citations72
US9523922B2Dec 20, 2016

Illumination system of a microlithographic projection exposure apparatus having a temperature control device

ZEISS CARL SMT GMBH3 citations71
US9448384B2Sep 20, 2016

Arrangement for mounting an optical element

ZEISS CARL SMT GMBH3 citations67
US9897925B2Feb 20, 2018

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH1 citations62
US9239229B2Jan 19, 2016

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH1 citations62
US9274434B2Mar 1, 2016

Light modulator and illumination system of a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH2 citations61
US9019475B2Apr 28, 2015

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH0 citations52
US9001309B2Apr 7, 2015

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH0 citations52
US9535336B2Jan 3, 2017

Microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH0 citations51

XALTER STEFAN

2 patents
US9013684B2Apr 21, 2015

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

XALTER STEFAN17 citations91
US8339577B2Dec 25, 2012

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

XALTER STEFAN9 citations82

DINGER UDO

1 patent
US9411241B2Aug 9, 2016

Facet mirror for use in a projection exposure apparatus for microlithography

DINGER UDO11 citations82

BLEIDISTEL SASCHA

1 patent
US8767176B2Jul 1, 2014

Microlithographic projection exposure apparatus

BLEIDISTEL SASCHA6 citations82

WERBER ARMIN

1 patent
US9013676B2Apr 21, 2015

Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography

WERBER ARMIN2 citations57

BACH FLORIAN

1 patent
US8797507B2Aug 5, 2014

Illumination system of a microlithographic projection exposure apparatus having a temperature control device

BACH FLORIAN2 citations54

WALDIS SEVERIN

1 patent
US8717531B2May 6, 2014

Mirror for guiding a radiation bundle

WALDIS SEVERIN1 citations44

ROHE THOMAS

1 patent
US8102506B2Jan 24, 2012

Method and device for controlling a plurality of actuators and an illumination device for lithography

ROHE THOMAS0 citations38