Inventor

SHIRAKAWA MICHIHIRO

JP46 patents

⚠️ This page may combine multiple inventors who share the name “SHIRAKAWA MICHIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIRAKAWA MICHIHIRO

FUJIFILM CORP

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound

Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device

Treatment liquid and pattern forming method

Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film and pattern forming method, each using composition, and method for manufacturing electronic device

Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

Composition for forming upper layer film, pattern forming method, resist pattern, and method for manufacturing electronic device

Pattern forming method, method for producing electronic device, and actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device

Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic device

Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device

Pattern forming method, treating agent, electronic device, and method for manufacturing the same

Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device

Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and method for manufacturing electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Pattern forming method, resist pattern, and process for producing electronic device

Pattern forming method, resist pattern, and method for manufacturing electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Negative tone photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device

Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film

Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound

Pattern forming method, actinic ray-sensitive or radiation-sensitive composition, and method for manufacturing electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin

Active-light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, method for manufacturing electronic device, compound, and resin

Pattern forming method, resist pattern, method for manufacturing electronic device, and composition for forming upper layer film

Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic device

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device

Pattern formation method, etching method, electronic device manufacturing method, and electronic device

TAKAHASHI HIDENORI

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device

IWATO KAORU

Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film using the same, pattern forming method, electronic device manufacturing method, and electronic device, each using the same

KATO TAKAYUKI

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same

YAMAGUCHI SHUHEI

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound

KATAOKA SHOHEI

Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film

TANGO NAOHIRO

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same