Inventor
SOBODACHA CHESTER J
US10 patents
Patents
10 patentsUS5374693ADec 20, 1994
Novolak resin blends for photoresist applications
HOECHST CELANESE CORP16 citations82
US4732836AMar 22, 1988
Novel mixed ester O-quinone photosensitizers
HOECHST CELANESE CORP22 citations80
US4732837AMar 22, 1988
Novel mixed ester O-quinone photosensitizers
HOECHST CELANESE CORP20 citations80
US5646218AJul 8, 1997
Novolak resin blends for photoresist applications
HOECHST CELANESE CORP7 citations73
US5221592AJun 22, 1993
Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester
HOECHST CELANESE CORP6 citations73
US5162510ANov 10, 1992
Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
HOECHST CELANESE CORP10 citations71
US5348842ASep 20, 1994
Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride
HOECHST CELANESE CORP4 citations62
US5035976AJul 30, 1991
Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
HOECHST CELANESE CORP3 citations60
US4902785AFeb 20, 1990
Phenolic photosensitizers containing quinone diazide and acidic halide substituents
HOECHST CELANESE CORP3 citations60
US4892801AJan 9, 1990
Mixed ester O-quinone diazide photosensitizers and process of preparation
HOECHST CELANESE CORP3 citations60