Inventor
KATANO TAKAYUKI
JP11 patents
Patents
11 patentsUS5876280AMar 2, 1999
Substrate treating system and substrate treating method
TOKYO ELECTRON LTD91 citations97
US6333003B1Dec 25, 2001
Treatment apparatus, treatment method, and impurity removing apparatus
TOKYO ELECTRON LTD39 citations92
US6097469AAug 1, 2000
Method of processing resist onto substrate and resist processing apparatus
TOKYO ELECTRON LTD24 citations92
US6063439AMay 16, 2000
Processing apparatus and method using solution
TOKYO ELECTRON LTD45 citations92
US6017663AJan 25, 2000
Method of processing resist utilizing alkaline component monitoring
TOKYO ELECTRON LTD25 citations92
US5944894AAug 31, 1999
Substrate treatment system
TOKYO ELECTRON LTD54 citations92
US5932380AAug 3, 1999
Method of processing resist utilizing alkaline component monitoring
TOKYO ELECTRON LTD29 citations92
US5928390AJul 27, 1999
Vertical processing apparatus
TOKYO ELECTRON LTD45 citations92
US6617095B2Sep 9, 2003
Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern
TOKYO ELECTRON LTD21 citations91
US6485203B2Nov 26, 2002
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD17 citations83
US7401988B2Jul 22, 2008
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD7 citations73