P

Inventor

CONLEY WILLARD E

US13 patents
⚠️ This page may combine multiple inventors who share the name “CONLEY WILLARD E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

7 patents
US5322765AJun 21, 1994

Dry developable photoresist compositions and method for use thereof

IBM47 citations91
US4931379AJun 5, 1990

High sensitivity resists having autodecomposition temperatures greater than about 160° C.

IBM30 citations91
US6207353B1Mar 27, 2001

Resist formulation which minimizes blistering during etching

IBM28 citations90
US5296332AMar 22, 1994

Crosslinkable aqueous developable photoresist compositions and method for use thereof

IBM49 citations90
US5240812AAug 31, 1993

Top coat for acid catalyzed resists

IBM35 citations90
US4828964AMay 9, 1989

Polyimide formulation for forming a patterned film on a substrate

IBM7 citations67
US7883829B2Feb 8, 2011

Lithography for pitch reduction

IBM4 citations62

FREESCALE SEMICONDUCTOR INC

2 patents
US9229051B2Jan 5, 2016

Integrated circuit with degradation monitoring

FREESCALE SEMICONDUCTOR INC6 citations72
US7741221B2Jun 22, 2010

Method of forming a semiconductor device having dummy features

FREESCALE SEMICONDUCTOR INC6 citations62

SHIPLEY CO LLC

1 patent
US6300035B1Oct 9, 2001

Chemically amplified positive photoresists

SHIPLEY CO LLC28 citations92

BRUNSVOLD WILLIAM R

1 patent
US4939070AJul 3, 1990

Thermally stable photoresists with high sensitivity

BRUNSVOLD WILLIAM R86 citations92

BASKER VEERARAGHAVAN S

1 patent
US8507187B2Aug 13, 2013

Multi-exposure lithography employing a single anti-reflective coating layer

BASKER VEERARAGHAVAN S0 citations42

CONLEY WILLARD E

1 patent
US8119334B2Feb 21, 2012

Method of making a semiconductor device using negative photoresist

CONLEY WILLARD E0 citations33