Inventor
CHENG PO-CHUNG
TW154 patents
Patents
50 patentsUS10314154B1Jun 4, 2019
System and method for extreme ultraviolet source control
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations92
US11086237B2Aug 10, 2021
Extreme ultraviolet lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US11086209B2Aug 10, 2021
EUV lithography mask with a porous reflective multilayer structure
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10656539B2May 19, 2020
Radiation source for lithography process
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10524345B2Dec 31, 2019
Residual gain monitoring and reduction for EUV drive laser
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US10429729B2Oct 1, 2019
EUV radiation modification methods and systems
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10274844B1Apr 30, 2019
Lithography apparatus and method for protecting a reticle
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations84
US11029324B2Jun 8, 2021
Particle image velocimetry of extreme ultraviolet lithography systems
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations83
US10718718B2Jul 21, 2020
EUV vessel inspection method and related system
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations83
US10875060B2Dec 29, 2020
Method and apparatus for removing debris from collector
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations82
US12055865B2Aug 6, 2024
Extreme ultraviolet lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11984314B2May 14, 2024
Particle removal method
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11832372B2Nov 28, 2023
EUV light source and apparatus for lithography
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11809075B2Nov 7, 2023
EUV lithography mask with a porous reflective multilayer structure
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11419203B2Aug 16, 2022
EUV radiation modification methods and systems
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11294293B2Apr 5, 2022
Overlay marks for reducing effect of bottom layer asymmetry
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11275318B2Mar 15, 2022
Radiation source for lithography process
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11272606B2Mar 8, 2022
EUV light source and apparatus for lithography
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11013097B2May 18, 2021
Apparatus and method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10980100B2Apr 13, 2021
Residual gain monitoring and reduction for EUV drive laser
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10969690B2Apr 6, 2021
Extreme ultraviolet control system for adjusting droplet illumination parameters
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10955762B2Mar 23, 2021
Radiation source apparatus and method for decreasing debris in radiation source apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10928741B2Feb 23, 2021
Radiation source for lithography process
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10917959B2Feb 9, 2021
EUV radiation modification methods and systems
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10877378B2Dec 29, 2020
Vessel for extreme ultraviolet radiation source
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10859928B2Dec 8, 2020
EUV light source and apparatus for lithography
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10842009B2Nov 17, 2020
System and method for extreme ultraviolet source control
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10791616B1Sep 29, 2020
Radiation source apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10747119B2Aug 18, 2020
Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10712676B2Jul 14, 2020
Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10687410B2Jun 16, 2020
Extreme ultraviolet radiation source and cleaning method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10642158B2May 5, 2020
Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10512147B1Dec 17, 2019
Extreme ultraviolet radiation source and droplet catcher thereof
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10495987B2Dec 3, 2019
Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10477663B2Nov 12, 2019
Light source for lithography exposure process
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10366973B2Jul 30, 2019
Layout modification method for exposure manufacturing process
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12085585B2Sep 10, 2024
Particle image velocimetry of extreme ultraviolet lithography systems
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11680958B2Jun 20, 2023
Particle image velocimetry of extreme ultraviolet lithography systems
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US11528798B2Dec 13, 2022
Replacement method for droplet generator
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11470710B2Oct 11, 2022
EUV light source and apparatus for EUV lithography
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US10880980B2Dec 29, 2020
EUV light source and apparatus for EUV lithography
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10880981B2Dec 29, 2020
Collector pellicle
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US10678138B2Jun 9, 2020
Extreme ultraviolet (EUV) radiation source and a method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US10670970B1Jun 2, 2020
Lithography system and method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US10429314B2Oct 1, 2019
EUV vessel inspection method and related system
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US12124178B2Oct 22, 2024
Lithography system and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11800626B2Oct 24, 2023
Shock wave visualization for extreme ultraviolet plasma optimization
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations71
US11675280B2Jun 13, 2023
Lithography system and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11062898B2Jul 13, 2021
Particle removal apparatus, particle removal system and particle removal method
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations71
US10534279B1Jan 14, 2020
Methods and apparatus for removing contamination from lithographic tool
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
Showing the top 50 of 154 patents by PatentIndex Score.