Inventor
CHEN LI-JUI
TW274 patents
⚠️ This page may combine multiple inventors who share the name “CHEN LI-JUI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
45 patentsUS10314154B1Jun 4, 2019
System and method for extreme ultraviolet source control
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations92
US11822256B2Nov 21, 2023
Semiconductor processing tool and methods of operation
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations85
US11693326B1Jul 4, 2023
System and method for dynamically controlling temperature of thermostatic reticles
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations85
US11086209B2Aug 10, 2021
EUV lithography mask with a porous reflective multilayer structure
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US11086237B2Aug 10, 2021
Extreme ultraviolet lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US10656539B2May 19, 2020
Radiation source for lithography process
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10527926B1Jan 7, 2020
Pressurized tin collection bucket with in-line draining mechanism
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US10524345B2Dec 31, 2019
Residual gain monitoring and reduction for EUV drive laser
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US10429729B2Oct 1, 2019
EUV radiation modification methods and systems
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10274844B1Apr 30, 2019
Lithography apparatus and method for protecting a reticle
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations84
US11029324B2Jun 8, 2021
Particle image velocimetry of extreme ultraviolet lithography systems
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations83
US10718718B2Jul 21, 2020
EUV vessel inspection method and related system
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations83
US10875060B2Dec 29, 2020
Method and apparatus for removing debris from collector
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations82
US12007694B2Jun 11, 2024
Lithography apparatus and method
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations74
US12078933B2Sep 3, 2024
System and method for omnidirectional real time detection of photolithography characteristics
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12061423B2Aug 13, 2024
Method and apparatus for mitigating tin debris
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12055865B2Aug 6, 2024
Extreme ultraviolet lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12055864B2Aug 6, 2024
Droplet generator and method of servicing a photolithographic tool
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12050399B2Jul 30, 2024
Pellicle assembly and method of making same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12019378B2Jun 25, 2024
Methods of cleaning a lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11832372B2Nov 28, 2023
EUV light source and apparatus for lithography
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11809075B2Nov 7, 2023
EUV lithography mask with a porous reflective multilayer structure
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11693324B2Jul 4, 2023
System and method for detecting debris in a photolithography system
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11662668B2May 30, 2023
Lithography contamination control
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11437161B1Sep 6, 2022
Lithography apparatus and method for using the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11419203B2Aug 16, 2022
EUV radiation modification methods and systems
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11392041B2Jul 19, 2022
Particle removal device and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11275318B2Mar 15, 2022
Radiation source for lithography process
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11275317B1Mar 15, 2022
Droplet generator and method of servicing a photolithographic tool
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11272606B2Mar 8, 2022
EUV light source and apparatus for lithography
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11029613B2Jun 8, 2021
Droplet generator and method of servicing extreme ultraviolet radiation source apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11013097B2May 18, 2021
Apparatus and method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10980100B2Apr 13, 2021
Residual gain monitoring and reduction for EUV drive laser
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10969690B2Apr 6, 2021
Extreme ultraviolet control system for adjusting droplet illumination parameters
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10955762B2Mar 23, 2021
Radiation source apparatus and method for decreasing debris in radiation source apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10928741B2Feb 23, 2021
Radiation source for lithography process
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10917959B2Feb 9, 2021
EUV radiation modification methods and systems
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10877378B2Dec 29, 2020
Vessel for extreme ultraviolet radiation source
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10859928B2Dec 8, 2020
EUV light source and apparatus for lithography
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10842009B2Nov 17, 2020
System and method for extreme ultraviolet source control
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10791616B1Sep 29, 2020
Radiation source apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10747119B2Aug 18, 2020
Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10719020B2Jul 21, 2020
Droplet generator and method of servicing extreme ultraviolet radiation source apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10712676B2Jul 14, 2020
Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10687410B2Jun 16, 2020
Extreme ultraviolet radiation source and cleaning method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
TAIWAN SEMICONDUCTOR MFG
3 patentsUS6973636B2Dec 6, 2005
Method of defining forbidden pitches for a lithography exposure tool
TAIWAN SEMICONDUCTOR MFG12 citations82
US9575415B2Feb 21, 2017
Wafer stage temperature control
TAIWAN SEMICONDUCTOR MFG8 citations76
US6744058B1Jun 1, 2004
Geometric compensation method for charged particle beam irradiation
TAIWAN SEMICONDUCTOR MFG12 citations74
IND TECH RES INST
1 patentCHEN LI-JUI
1 patentShowing the top 50 of 274 patents by PatentIndex Score.